SCHEMBL29363000

SCHEMBL29363000

[Al].[Al].[Al].[Ta]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29358840 1.00
SCHEMBL5671250 1.00
SCHEMBL31532950 0.82
SCHEMBL715758 0.82
SCHEMBL31258308 0.82
SCHEMBL5067798 0.82
Charcoal, Activated SCHEMBL11150029 0.82
SCHEMBL11489224 0.82
SCHEMBL8832642 0.82
SCHEMBL5271385 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 803 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260103001-A1 INKJET CHIP STRUCTURE MICROJET TECHNOLOGY CO., LTD. (TW) 2026-04-16 US claimed
US-12484257-B2 Method of forming gate structures for nanostructures TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) 2025-11-25 US claimed
US-20250319698-A1 INKJET CHIP STRUCTURE MICROJET TECHNOLOGY CO., LTD. (TW) 2025-10-16 US claimed
US-20250169169-A1 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME UNITED MICROELECTRONICS CORP. (TW) 2025-05-22 US claimed
CN-119773371-A Ink jet head identification element 研能科技股份有限公司 2025-04-08 CN claimed
CN-119682396-A Ink jet chip packaging structure 研能科技股份有限公司 2025-03-25 CN claimed
US-20250081498-A1 SEMICONDUCTOR STRUCTURE United Semiconductor (Xiamen) Co., Ltd. (CN) 2025-03-06 US claimed
CN-119550730-A Ink jet chip structure 研能科技股份有限公司 2025-03-04 CN claimed
US-12237329-B2 Semiconductor device and method for fabricating the same UNITED MICROELECTRONICS CORP. (TW) 2025-02-25 US claimed
US-12218137-B2 Structure and method for gate-all-around metal-oxide-semiconductor devices with improved channel configurations TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2025-02-04 US claimed
US-11674221-B2 Erosion / corrosion resistant barrier coating CONAX TECHNOLOGIES (US) 2023-06-13 US claimed
US-11631617-B2 Scalable device for FINFET technology INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-04-18 US claimed
US-11437489-B2 Techniques for forming replacement metal gate for VFET INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2022-09-06 US claimed
US-20220278197-A1 SEMICONDUCTOR DEVICE AND METHOD TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2022-09-01 US claimed
CN-114750513-A Wafer structure 研能科技股份有限公司 2022-07-15 CN claimed
CN-114750514-A Wafer structure 研能科技股份有限公司 2022-07-15 CN claimed
US-20220219456-A1 WAFER STRUCTURE MICROJET TECHNOLOGY CO., LTD. (TW) 2022-07-14 US claimed
US-20220219454-A1 WAFER STRUCTURE MICROJET TECHNOLOGY CO., LTD. (TW) 2022-07-14 US claimed
US-20220149195-A1 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH SIDEWALL OXIDIZED DIELECTRIC NANYA TECHNOLOGY CORPORATION (TW) 2022-05-12 US claimed
US-11315922-B2 Fin cut to prevent replacement gate collapse on STI INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2022-04-26 US claimed