SCHEMBL29366122

SCHEMBL29366122

CC1(C(=O)OC2CCC3(C)OC3C2)CCC2OC2C1

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PDE4D Q08499 1/20 0.34
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23781835 0.84 CYP3A4 (0.33) CYP3A4
SCHEMBL217734 0.82
SCHEMBL29703135 0.79 PDE4D (0.34) PDE4D
SCHEMBL464840 0.78 CYP2C19 (0.36)
Water SCHEMBL28081683 0.77 CYP2C19 (0.36)
SCHEMBL18920943 0.76 PPM1B (0.36)
SCHEMBL16943993 0.74 ALDH1A1 (0.39) CYP3A4
SCHEMBL28014814 0.73
SCHEMBL9340832 0.72
SCHEMBL29625551 0.72 PDE4D (0.32) PDE4DCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110520794-B Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer 株式会社艾迪科 2025-04-04 CN disclosed
CN-113264856-B Sulfonium salt, photoacid generator, and photosensitive composition 东京应化工业株式会社 2022-11-22 CN disclosed
CN-115279768-A Stereoisomer of epoxy compound, curable composition containing same, and cured product obtained by curing curable composition 引能仕株式会社 2022-11-01 CN disclosed
CN-111690308-B Energy-curable composition and use thereof in the field of energy curing 常州强力先端电子材料有限公司 2022-02-01 CN disclosed