Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.66 |
| ▸ | MAPT | P10636 | 6/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.61 |
| ▸ | SELL | P14151 | 1/20 | 0.59 |
| ▸ | SELP | P16109 | 1/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | USP2 | O75604 | 1/20 | 0.58 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.58 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | HPGD | P15428 | 4/20 | 0.56 |
| ▸ | RECQL | P46063 | 3/20 | 0.56 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.54 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL93423 | 1.00 | HDAC1 (0.66) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL27811794 | 1.00 | HDAC1 (0.66) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Benzophenone SCHEMBL28066611 | 0.98 | HDAC1 (0.63) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL9686292 | 0.94 | SELL (0.70) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL8861471 | 0.93 | MEN1 (0.61) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL5069965 | 0.91 | MAPT (0.69) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL10768257 | 0.91 | HDAC1 (0.61) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Exifone SCHEMBL18993025 | 0.89 | HDAC1 (0.80) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL3656665 | 0.89 | HDAC1 (0.73) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Gallic Acid SCHEMBL28164968 | 0.88 | HDAC1 (0.72) | HDAC1MAPTKDM4EHSD17B10ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 385 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| CN-122070479-A | Ultrasonic indicating device and method for monitoring ultrasonic treatment | JP实验室股份有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-120059433-A | Shading material and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-120059246-A | Chemical bonding type rare earth light conversion film and preparation method and application thereof | 中国科学院赣江创新研究院 | 2025-05-30 | — | — | CN | claimed |
| CN-120005123-A | Acrylic ester block copolymer resin, photoresist, and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| WO-2025090061-A1 | ULTRASONIC INDICATOR DEVICE AND METHOD FOR MONITORING ULTRASONICATION | JP LABORATORIES, INC. (US) | 2025-05-01 | — | — | WO | claimed |
| CN-119859113-A | Continuous flow preparation method of photosensitizer | 杭州先研科技有限公司 | 2025-04-22 | — | — | CN | claimed |
| WO-2025075611-A1 | ULTRASONIC INDICATOR BASED ON EMULSION FORMATION | JP LABORATORIES, INC. (US) | 2025-04-10 | — | — | WO | claimed |
| CN-114859676-B | Photoetching method for improving resolution of positive photoresist thick film | 明士(北京)新材料开发有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-118931124-A | Food packaging material based on cellulose nanocrystals | 中国海洋大学 | 2024-11-12 | — | — | CN | claimed |
| CN-116003659-A | Hydrophobic polymer, preparation method thereof, coating material containing hydrophobic polymer and method for constructing hydrophobic/super-hydrophobic surface by using hydrophobic polymer | 中国科学院过程工程研究所 | 2023-04-25 | — | — | CN | claimed |
| CN-115826356-A | Photoresist, display panel and manufacturing method thereof | TCL华星光电技术有限公司 | 2023-03-21 | — | — | CN | claimed |
| CN-107728426-B | Photoresist composition and method for forming metal pattern using the same | 三星显示有限公司 | 2022-11-04 | — | — | CN | claimed |
| CN-115167078-A | Positive photoresist composition, cured film and synthesis method thereof | 漳州思美科新材料有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-110441989-B | Photoresist composition | 沧州信联化工有限公司 | 2022-08-23 | — | — | CN | claimed |
| CN-114859676-A | Photoetching method for improving resolution of positive photoresist thick film | 明士(北京)新材料开发有限公司 | 2022-08-05 | — | — | CN | claimed |
| CN-114545739-A | High-sensitivity positive photoresist composition, synthesis method thereof and cured film | 深圳迪道微电子科技有限公司 | 2022-05-27 | — | — | CN | claimed |
| CN-114478930-A | Preparation method of polybutadiene latex and prepared ABS resin | 万华化学集团股份有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-114137795-A | Photoresist composition and application thereof | 广东粤港澳大湾区黄埔材料研究院 | 2022-03-04 | — | — | CN | claimed |
| CN-114144454-A | Improved operating time to open-run time ratio by adding phenolic catalysts to polyaspartic flooring formulations | 科思创有限公司 | 2022-03-04 | — | — | CN | claimed |