Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.66 |
| ▸ | MAPT | P10636 | 6/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.61 |
| ▸ | SELL | P14151 | 1/20 | 0.59 |
| ▸ | SELP | P16109 | 1/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | USP2 | O75604 | 1/20 | 0.58 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.58 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | HPGD | P15428 | 4/20 | 0.56 |
| ▸ | RECQL | P46063 | 3/20 | 0.56 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.54 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366285 | 1.00 | HDAC1 (0.66) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL27811794 | 1.00 | HDAC1 (0.66) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Benzophenone SCHEMBL28066611 | 0.98 | HDAC1 (0.63) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL9686292 | 0.94 | SELL (0.70) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL8861471 | 0.93 | MEN1 (0.61) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL5069965 | 0.91 | MAPT (0.69) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL10768257 | 0.91 | HDAC1 (0.61) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Exifone SCHEMBL18993025 | 0.89 | HDAC1 (0.80) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| SCHEMBL3656665 | 0.89 | HDAC1 (0.73) | HDAC1MAPTKDM4EHSD17B10ALOX15 | |
| Gallic Acid SCHEMBL28164968 | 0.88 | HDAC1 (0.72) | HDAC1MAPTKDM4EHSD17B10ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9653 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025217103-A1 | DURABLE ION EXCHANGE MEMBRANES WITH ADDITIVES | W. L. GORE & ASSOCIATES, INC. (US) | 2025-10-16 | — | — | WO | claimed |
| US-12440607-B2 | Multifunctional crosslinkers: compounds, compositions, and products thereof | BIOCOAT, INCORPORATED (US) | 2025-10-14 | — | — | US | claimed |
| US-20250194617-A1 | Materials and Methods for Extending Shelf-Life of Foods | JP LABORATORIES, INC. | 2025-06-19 | — | — | US | claimed |
| US-20250169514-A1 | Materials and Methods for Extending Shelf-Life of Foods | JP LABORATORIES, INC. | 2025-05-29 | — | — | US | claimed |
| WO-2025090061-A1 | ULTRASONIC INDICATOR DEVICE AND METHOD FOR MONITORING ULTRASONICATION | JP LABORATORIES, INC. (US) | 2025-05-01 | — | — | WO | claimed |
| WO-2025075611-A1 | ULTRASONIC INDICATOR BASED ON EMULSION FORMATION | JP LABORATORIES, INC. (US) | 2025-04-10 | — | — | WO | claimed |
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| US-12195636-B2 | Resin composition, cured product, sheet lamination material, resin sheet, printed wiring board, and semiconductor device, and method for producing printed wiring board | AJINOMOTO CO., INC. (JP) | 2025-01-14 | — | — | US | claimed |
| CN-115793397-B | High-precision quartz substrate gluing and production process thereof | 安徽禾臣新材料有限公司 | 2024-11-05 | — | — | CN | claimed |
| CN-118085587-B | Ultraviolet absorber, modified polyester, and preparation methods and applications thereof | 中国科学院宁波材料技术与工程研究所 | 2024-06-25 | — | — | CN | claimed |
| EP-0096282-A2 | Light-sensitive compounds for positive photoresist materials | MERCK PATENT GmbH (DE) | 1983-12-21 | — | — | EP | claimed |
| US-4411978-A | WITH ALKALINE SOLUBLE POLYMERS | AGFA-GEVAERT N.V. (BE) | 1983-10-25 | — | — | US | claimed |
| EP-0089249-A2 | A developer solution for a positive-working light-sensitive composition, and a method of development using the developer solution | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1983-09-21 | — | — | EP | claimed |
| EP-0010749-B1 | PHOTOSENSITIVE COMPOSITION AND REPRODUCTION MATERIAL MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-12-22 | — | — | EP | claimed |
| US-4308368-A | PHOTORESISTS, PRINTING PLATES, STORAGE STABILITY | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 1981-12-29 | — | — | US | claimed |
| US-4275139-A | Light-sensitive mixture and copying material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-06-23 | — | — | US | claimed |
| US-4211834-A | Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1980-07-08 | — | — | US | claimed |
| EP-0010749-A1 | Photosensitive composition and reproduction material made therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-05-14 | — | — | EP | claimed |
| EP-0002999-A2 | Process for the formation of a masking layer on a substrate so as to obtain a mask | International Business Machines Corporation (US) | 1979-07-11 | — | — | EP | claimed |
| US-3930857-A | RESIST PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1976-01-06 | — | — | US | claimed |