Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TLR9 | Q9NR96 | 3/20 | 0.70 |
| ▸ | MGLL | Q99685 | 13/20 | 0.57 |
| ▸ | FAAH | O00519 | 3/20 | 0.52 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.52 |
| ▸ | PKM | P14618 | 2/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | CCR6 | P51684 | 1/20 | 0.52 |
| ▸ | ATM | Q13315 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | BRD4 | O60885 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL142504 | 1.00 | TLR9 (0.70) | TLR9MGLLFAAHHSP90AA1PKM | |
| Formaldehyde SCHEMBL28487390 | 0.96 | TLR9 (0.64) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL9418786 | 0.84 | MGLL (0.81) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL29216876 | 0.83 | MGLL (0.50) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL121404 | 0.83 | TLR9 (1.00) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL29377102 | 0.83 | TLR9 (1.00) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL30000205 | 0.79 | ESR1 (0.55) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL27986255 | 0.79 | ESR1 (0.55) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL8612834 | 0.77 | MGLL (0.59) | TLR9MGLLFAAHHSP90AA1PKM | |
| SCHEMBL26659392 | 0.77 | CA12 (0.55) | TLR9MGLLHSP90AA1PKMNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119604817-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-03-11 | — | — | CN | claimed |
| CN-118834595-A | Bio-based modified polyurethane resin coating | 长兴化学（天津）有限公司 | 2024-10-25 | — | — | CN | claimed |
| CN-116848466-A | Positive photosensitive resin composition | 日产化学株式会社 | 2023-10-03 | — | — | CN | claimed |
| CN-120051729-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119768741-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119604817-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-03-11 | — | — | CN | disclosed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-112602014-B | Method for producing liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2025-02-11 | — | — | CN | disclosed |
| CN-112639618-B | Negative photosensitive resin composition | 日产化学株式会社 | 2025-01-28 | — | — | CN | disclosed |
| CN-111683986-B | Composition for forming cured film, alignment material, and retardation material | 日产化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-113234194-B | Copolymer, primer composition, double-layer system and application of double-layer system in double-layer stripping process | 北京科华微电子材料有限公司 | 2022-08-12 | — | — | CN | disclosed |
| WO-2022168732-A1 | POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2022-08-11 | — | — | WO | disclosed |
| CN-109791352-B | Photosensitive resin composition, method for producing conductive pattern, substrate, touch panel, and display | 东丽株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-114432301-A | Covalent inhibitor derivative and application thereof in treating virus infection | 北京大学 | 2022-05-06 | — | — | CN | disclosed |
| WO-2022069948-A1 | HIGH TEMPERATURE BENZOXAZINE RESINS, METHODS, AND USES THEREOF | KANEKA CORPORATION (JP) | 2022-04-07 | — | — | WO | disclosed |
| WO-2022070946-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED PRODUCT | 東レ株式会社 | 2022-04-07 | — | — | WO | disclosed |
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-114174351-A | Resin composition | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| CN-109715747-B | Cured film-forming composition | 日产化学株式会社 | 2022-02-01 | — | — | CN | disclosed |