Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9685977 | 0.81 | HSD17B10 (0.31) | HSD17B10 | |
| SCHEMBL1868281 | 0.81 | IDO1 (0.33) | HPGDHSD17B10ALDH1A1MAPK1L3MBTL1 | |
| SCHEMBL9685062 | 0.79 | GAA (0.33) | HSD17B10NPSR1MAPK1L3MBTL1MAPT | |
| Hydrochloric Acid SCHEMBL8414521 | 0.79 | IDO1 (0.32) | HPGDALDH1A1MAPK1L3MBTL1NPC1 | |
| Hydrochloric Acid SCHEMBL11327236 | 0.78 | HSD17B10 (0.31) | HSD17B10 | |
| SCHEMBL10905077 | 0.77 | AKR1C3 (0.32) | HPGDALDH1A1ALOX15MAPK1L3MBTL1 | |
| SCHEMBL9633580 | 0.76 | — | — | |
| Sulfuric Acid SCHEMBL6351261 | 0.74 | IDO1 (0.35) | HPGDALDH1A1ALOX15MAPK1TDP1 | |
| SCHEMBL9685133 | 0.73 | LTA4H (0.36) | ALDH1A1SLC6A2MAPK1HTR2B | |
| SCHEMBL9633301 | 0.73 | SRC (0.37) | HPGDHSD17B10ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6514657-B1 | Binder, diazo resin, monomer or oligimer with at least two double bonds, photopolymerization initiator and derivatives of o-tert-butylphenol and 2-mercaptoimidazole; long press life, high sensitivity, storage stability | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-02-04 | — | — | US | claimed |
| US-9588424-B2 | Photosensitive resin composition for screen printing, photosensitive film, and screen plate | SUNTYPE CO., LTD. (JP) | 2017-03-07 | — | — | US | disclosed |
| US-20150212413-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PRINTING, PHOTOSENSITIVE FILM, AND SCREEN PLATE | SUNTYPE CO., LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| WO-2012030114-A3 | CATHODE ACTIVE MATERIAL FOR SECONDARY BATTERY | 주식회사 엘지화학 (KR) | 2012-05-10 | — | — | WO | disclosed |
| EP-1653281-B1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | KODAK GRAPHIC COMM JAPAN LTD (JP) | 2010-09-29 | — | — | EP | disclosed |
| EP-1468332-B1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS CO (US) | 2010-03-31 | — | — | EP | disclosed |
| EP-1476786-B1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE USING THE SAME | KODAK GRAPHIC COMM JAPAN LTD (JP) | 2010-01-06 | — | — | EP | disclosed |
| EP-1453675-B1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | EASTMAN KODAK CO (US) | 2009-10-07 | — | — | EP | disclosed |
| EP-1302504-B1 | Hydrophilic member precursor and pattern forming material that utilizes it, support for planographic printing plate, and planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-06-03 | — | — | EP | disclosed |
| US-7291438-B2 | Negative photosensitive composition and negative photosensitive lithographic printing plate | EASTMAN KODAK COMPANY (US) | 2007-11-06 | — | — | US | disclosed |
| EP-1013469-A1 | Process for the preparation of photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-28 | — | — | EP | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0945281-A2 | Heat sensitive composition, lithographic printing plate using the same, and process for preparing a lithographic printing plate | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1999-09-29 | — | — | EP | disclosed |
| US-5731127-A | WEAR RESISTANCE, SOLVENT RESISTANCE | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0517245-B1 | Developer for light-sensitive material | DAINIPPON INK & CHEMICALS (JP) | 1998-02-11 | — | — | EP | disclosed |
| EP-0737896-A2 | Photosensitive composition and photosensitive planographic printing plate | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1996-10-16 | — | — | EP | disclosed |
| US-5275915-A | Alkali metal compounds with anionic surfactant and antifoggant for silver halide photographic films | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-01-04 | — | — | US | disclosed |
| EP-0517245-A1 | Developer for light-sensitive material | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-12-09 | — | — | EP | disclosed |
| US-5122442-A | Water soluble binder; photosensitive compound | HOECHST CELANESE CORPORATION (US) | 1992-06-16 | — | — | US | disclosed |
| US-4304832-A | Photosensitive resin composition containing diazodiphenylamine-aldehyde condensate | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1981-12-08 | — | — | US | disclosed |