SCHEMBL29368652

SCHEMBL29368652

CCCCOc1c2ccccc2cc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 1/20 0.48
TDP1 Q9NUW8 2/20 0.47
GAA P10253 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
TLR8 Q9NR97 1/20 0.45
CYP1A2 P05177 2/20 0.44
ABCB11 O95342 1/20 0.44
LMNA P02545 1/20 0.44
CYP2D6 P10635 1/20 0.44
SCN1A P35498 1/20 0.44
SCN2A Q99250 1/20 0.44
SCN3A Q9NY46 1/20 0.44
LTA4H P09960 2/20 0.44
HTR1B P28222 2/20 0.44
CNR1 P21554 1/20 0.43
CNR2 P34972 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
KCNH2 Q12809 2/20 0.42
GABRP O00591 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL293401 1.00 SLC2A1 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL23089937 0.94 TLR8 (0.46) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL29368699 0.94 TLR8 (0.46) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL23089944 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL3999665 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL29371854 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL23089961 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL23271667 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL23089946 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8
SCHEMBL29368730 0.93 TLR8 (0.48) SLC2A1TDP1GAAL3MBTL1TLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116830039-A Photosensitive resin composition, photosensitive resin sheet, cured product, hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-09-29 CN disclosed
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-114730127-B Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-05-12 CN disclosed
CN-114730127-A Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2022-07-08 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed