SCHEMBL29370984

SCHEMBL29370984

CCCCCC(=O)Oc1c2ccccc2c(OC(=O)CCCCC)c2cc(Br)ccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.45
▸ KDM4E B2RXH2 1/20 0.45
▸ MEN1 O00255 1/20 0.45
▸ RECQL P46063 1/20 0.45
▸ ALOX15 P16050 1/20 0.41
▸ EPHX2 P34913 1/20 0.40
▸ POLM Q9NP87 1/20 0.39
▸ POLK Q9UBT6 1/20 0.39
▸ POLL Q9UGP5 1/20 0.39
▸ POLH Q9Y253 1/20 0.39
▸ LMNA P02545 1/20 0.38
▸ CYP1A2 P05177 1/20 0.38
▸ POLB P06746 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ CYP2C9 P11712 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ NPY1R P25929 1/20 0.38
▸ NPY2R P49146 1/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ MGLL Q99685 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371953 0.99 KMT2A (0.44) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL29369104 0.96 MEN1 (0.49) KMT2AKDM4EMEN1RECQLLMNA
SCHEMBL24897463 0.92 KMT2A (0.40) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL29368692 0.87 KMT2A (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL20398450 0.87 KMT2A (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL20398671 0.85 EPHX2 (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL20398624 0.85 EPHX2 (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL20398590 0.85 EPHX2 (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL23271733 0.85 EPHX2 (0.51) KMT2AKDM4EMEN1RECQLALOX15
SCHEMBL29360726 0.85 EPHX2 (0.51) KMT2AKDM4EMEN1RECQLALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
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