SCHEMBL24897463

SCHEMBL24897463

CCCC(=O)Oc1c2ccccc2c(OC(=O)CCC)c2cc(Br)ccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.40
▸ MEN1 O00255 3/20 0.40
▸ RXFP1 Q9HBX9 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ TSPO P30536 1/20 0.39
▸ KDM4E B2RXH2 3/20 0.39
▸ RECQL P46063 1/20 0.39
▸ ALOX15 P16050 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.37
▸ GLA P06280 1/20 0.37
▸ GAA P10253 1/20 0.37
▸ GSK3B P49841 1/20 0.37
▸ PDGFRB P09619 1/20 0.37
▸ PDGFRA P16234 1/20 0.37
▸ BCL9 O00512 1/20 0.37
▸ CTNNB1 P35222 1/20 0.37
▸ GABRA1 P14867 1/20 0.36
▸ GABRB1 P18505 1/20 0.36
▸ GABRA3 P34903 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29369104 0.93 MEN1 (0.49) KMT2AMEN1RXFP1MAPTMAPK1
SCHEMBL29370984 0.92 KMT2A (0.45) KMT2AMEN1MAPTMAPK1KDM4E
SCHEMBL29371953 0.90 KMT2A (0.44) KMT2AMEN1MAPK1KDM4ERECQL
SCHEMBL24893028 0.89 KMT2A (0.41) KMT2AMEN1RXFP1MAPTMAPK1
SCHEMBL29372046 0.85 BCL9 (0.46) KMT2AMEN1MAPTMAPK1KDM4E
SCHEMBL20398454 0.85 BCL9 (0.46) KMT2AMEN1MAPTMAPK1KDM4E
SCHEMBL24897328 0.83 KDM4E (0.39) KMT2AMEN1MAPTKDM4ERECQL
SCHEMBL20398684 0.83 GAA (0.44) KMT2AMEN1MAPTMAPK1KDM4E
SCHEMBL29371793 0.83 GAA (0.44) KMT2AMEN1MAPTMAPK1KDM4E
SCHEMBL20398672 0.83 LMNA (0.47) KMT2AMEN1MAPTKDM4ERECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 — — CN disclosed
WO-2023283915-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD OF PRODUCING WIRING BOARD SHOWA DENKO MATERIALS CO., LTD. (JP) 2023-01-19 — — WO disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
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