SCHEMBL29370992

SCHEMBL29370992

CCCCC(=O)Oc1c2ccccc2c(OC(=O)CCCC)c2c(C)cccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
KDM4E B2RXH2 1/20 0.46
RECQL P46063 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.42
AKR1B1 P15121 2/20 0.39
LDHA P00338 1/20 0.39
LDHB P07195 1/20 0.39
POLM Q9NP87 1/20 0.37
POLK Q9UBT6 1/20 0.37
POLL Q9UGP5 1/20 0.37
POLH Q9Y253 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
GAA P10253 1/20 0.36
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20398689 0.96 KMT2A (0.42) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL29371921 0.96 KMT2A (0.42) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL31080897 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL20398431 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL29370917 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL20398653 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL20398527 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL20398495 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL20398461 0.95 POLM (0.43) MEN1KMT2AKDM4ERECQLSMN1; SMN2
SCHEMBL29372001 0.93 SMN1; SMN2 (0.45) MEN1KMT2AKDM4ERECQLSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111413849-B Photosensitive composition, preparation method thereof, pattern forming method and application 常州强力先端电子材料有限公司 2024-03-01 CN disclosed
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed