SCHEMBL29372001

SCHEMBL29372001

CCCC(=O)Oc1c2ccccc2c(OC(=O)CCC)c2c(C)cccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.45
KMT2A Q03164 6/20 0.40
MEN1 O00255 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
LMNA P02545 1/20 0.39
KDM4E B2RXH2 3/20 0.38
HTT P42858 2/20 0.38
GAA P10253 2/20 0.38
TP53 P04637 1/20 0.38
MAPT P10636 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ATM Q13315 1/20 0.38
ALDH1A1 P00352 2/20 0.37
GLA P06280 1/20 0.37
BCL9 O00512 1/20 0.37
CTNNB1 P35222 1/20 0.37
AKR1B1 P15121 1/20 0.36
RECQL P46063 1/20 0.36
ALOX15 P16050 1/20 0.35
F2R P25116 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20398545 1.00 SMN1; SMN2 (0.45) SMN1; SMN2KMT2AMEN1L3MBTL1LMNA
SCHEMBL29370992 0.93 MEN1 (0.46) SMN1; SMN2KMT2AMEN1L3MBTL1LMNA
SCHEMBL29371921 0.92 KMT2A (0.42) SMN1; SMN2KMT2AMEN1KDM4EAKR1B1
SCHEMBL20398689 0.92 KMT2A (0.42) SMN1; SMN2KMT2AMEN1KDM4EAKR1B1
SCHEMBL20398431 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT
SCHEMBL20398495 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT
SCHEMBL20398653 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT
SCHEMBL20398527 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT
SCHEMBL31080897 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT
SCHEMBL29370917 0.90 POLM (0.43) SMN1; SMN2KMT2AMEN1KDM4EHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed