Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 11/20 | 0.75 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.71 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.64 |
| ▸ | PGR | P06401 | 1/20 | 0.64 |
| ▸ | AR | P10275 | 1/20 | 0.64 |
| ▸ | MAOB | P27338 | 4/20 | 0.61 |
| ▸ | MEN1 | O00255 | 7/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.57 |
| ▸ | NPC1 | O15118 | 4/20 | 0.57 |
| ▸ | HTT | P42858 | 4/20 | 0.57 |
| ▸ | LMNA | P02545 | 4/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.57 |
| ▸ | USP2 | O75604 | 3/20 | 0.57 |
| ▸ | RAB9A | P51151 | 3/20 | 0.57 |
| ▸ | ATM | Q13315 | 3/20 | 0.57 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.57 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18113715 | 1.00 | MAPT (0.75) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL19368141 | 0.86 | MAOB (0.65) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL19347224 | 0.85 | MAPT (0.58) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL13870233 | 0.84 | MAPT (0.59) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL13869410 | 0.84 | CYP19A1 (0.77) | MAPTCYP19A1MAOBMEN1KMT2A | |
| SCHEMBL13886341 | 0.84 | CYP19A1 (0.77) | MAPTCYP19A1MAOBMEN1KMT2A | |
| SCHEMBL19361375 | 0.83 | MAOB (0.61) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL13869575 | 0.82 | CYP19A1 (0.75) | MAPTCYP19A1MAOBMEN1KMT2A | |
| SCHEMBL19361382 | 0.82 | MAPT (0.56) | MAPTCYP19A1NR3C1PGRAR | |
| SCHEMBL13869506 | 0.80 | CYP19A1 (0.86) | MAPTCYP19A1MAOBMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119270581-B | Imaging method and device based on two-photon absorption effect | 之江实验室 | 2025-05-13 | — | — | CN | claimed |
| CN-119270597-B | Super-resolution laser direct writing and imaging method and device based on two-photon and stimulated radiation loss effect | 浙江大学 | 2025-04-11 | — | — | CN | claimed |
| CN-119270581-A | Imaging method and device based on two-photon absorption effect | 之江实验室 | 2025-01-07 | — | — | CN | claimed |
| CN-119270597-A | Super-resolution laser direct writing and imaging method and device based on two-photon and stimulated radiation loss effect | 浙江大学 | 2025-01-07 | — | — | CN | claimed |
| CN-116300310-B | Method and device for realizing super-resolution inscription and imaging by utilizing photoinitiator | 之江实验室 | 2024-04-16 | — | — | CN | claimed |
| CN-116300310-A | Method and device for realizing super-resolution inscription and imaging by utilizing photoinitiator | 之江实验室 | 2023-06-23 | — | — | CN | claimed |
| CN-119270581-B | Imaging method and device based on two-photon absorption effect | 之江实验室 | 2025-05-13 | — | — | CN | disclosed |
| CN-119270597-B | Super-resolution laser direct writing and imaging method and device based on two-photon and stimulated radiation loss effect | 浙江大学 | 2025-04-11 | — | — | CN | disclosed |
| CN-119395945-A | Photosensitive resin composition, photosensitive element, method for producing wiring board, and photosensitive element roll | 株式会社力森诺科 | 2025-02-07 | — | — | CN | disclosed |
| CN-119270581-A | Imaging method and device based on two-photon absorption effect | 之江实验室 | 2025-01-07 | — | — | CN | disclosed |
| CN-119270597-A | Super-resolution laser direct writing and imaging method and device based on two-photon and stimulated radiation loss effect | 浙江大学 | 2025-01-07 | — | — | CN | disclosed |
| CN-113557474-B | Photosensitive resin composition, photosensitive element, method for producing wiring board, and photosensitive element roll | 株式会社力森诺科 | 2024-12-13 | — | — | CN | disclosed |
| CN-119045281-A | Photosensitive resin composition, photosensitive element, and method for producing wiring board | 株式会社力森诺科 | 2024-11-29 | — | — | CN | disclosed |
| CN-116300310-B | Method and device for realizing super-resolution inscription and imaging by utilizing photoinitiator | 之江实验室 | 2024-04-16 | — | — | CN | disclosed |
| CN-117590693-A | High-refractive-index two-photon photoresist composition and preparation method and application thereof | 浙江扬帆新材料股份有限公司 | 2024-02-23 | — | — | CN | disclosed |
| CN-116300310-A | Method and device for realizing super-resolution inscription and imaging by utilizing photoinitiator | 之江实验室 | 2023-06-23 | — | — | CN | disclosed |
| CN-116300310-A | Method and device for realizing super-resolution inscription and imaging by utilizing photoinitiator | 之江实验室 | 2023-06-23 | — | — | CN | disclosed |
| CN-116194840-A | Photosensitive resin composition, permanent resist, method for forming permanent resist, and method for inspecting cured film for permanent resist | 株式会社力森诺科 | 2023-05-30 | — | — | CN | disclosed |
| CN-114144636-A | Plastic wavelength-shifting optical fiber | 株式会社可乐丽 | 2022-03-04 | — | — | CN | disclosed |
| CN-114026496-A | Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic device | 昭和电工材料株式会社 | 2022-02-08 | — | — | CN | disclosed |