SCHEMBL2938716

SCHEMBL2938716

N#CC1CCCCC1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5511095 1.00
SCHEMBL5511096 1.00
SCHEMBL27456093 0.97 CA1 (0.36)
SCHEMBL8906437 0.94
SCHEMBL28525659 0.94
SCHEMBL18070918 0.94
SCHEMBL6743146 0.94
SCHEMBL8906433 0.94
SCHEMBL2971225 0.91 GRM4 (0.33)
Cyanide SCHEMBL9274569 0.90 DPP4 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106316865-B The synthetic method of 2 aminomethyl cyclohexylamine 岳阳昌德化工实业有限公司 2018-02-16 CN claimed
CN-106316865-A Synthetic method of 2-(aminomethyl)cyclohexanamine 岳阳昌德化工实业有限公司 2017-01-11 CN claimed
CN-106316865-B The synthetic method of 2 aminomethyl cyclohexylamine 岳阳昌德化工实业有限公司 2018-02-16 CN disclosed
CN-106316865-A Synthetic method of 2-(aminomethyl)cyclohexanamine 岳阳昌德化工实业有限公司 2017-01-11 CN disclosed
CN-106316865-A Synthetic method of 2-(aminomethyl)cyclohexanamine 岳阳昌德化工实业有限公司 2017-01-11 CN disclosed
US-8580481-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2013-11-12 US disclosed
EP-2114394-B1 PLATINUM ANALOGS WITH BIS-NITRILE-CONTAINING LIGANDS BIONUMERIK PHARMACEUTICALS INC (US) 2012-08-15 EP disclosed
EP-2114394-B1 PLATINUM ANALOGS WITH BIS-NITRILE-CONTAINING LIGANDS BIONUMERIK PHARMACEUTICALS INC (US) 2012-08-15 EP disclosed
US-20120034561-A1 RESIST POLYMER AND RESIST COMPOSITION MITSUBISHI RAYON CO., LTD. (JP) 2012-02-09 US disclosed
US-8092979-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2012-01-10 US disclosed
EP-1308518-B2 Method of producing carboxylic acids DAICEL CHEM (JP) 2010-09-22 EP disclosed
CN-1186061-A Method of producing carboxylic acids DAICEL CHEM (JP) 1998-07-01 CN disclosed
US-5763652-A Process for producing a carboxylic acid DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-09 US disclosed
WO-1997037967-A1 CALCILYTIC COMPOUNDS NPS PHARMACEUTICALS, INC. (US) 1997-10-16 WO disclosed
CN-1138020-A Process for producing carboxylic acid DAICEL CHEM (JP) 1996-12-18 CN disclosed
EP-0731079-A2 Process for producing a carboxylic acid DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-11 EP disclosed
US-4010113-A TUNGSTEN OR MOLYBDENUM HALIDE- AN ALKYLALUMINUM HALIDE-ALCOHOL THE GOODYEAR TIRE & RUBBER COMPANY (US) 1977-03-01 US disclosed
US-3997471-A TUNGSTEN OR MOLYBDENUM HALIDE OR OXYHALIDE, AN ALKYLALUMINUM HALIDE, ALCOHOL THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-12-14 US disclosed
US-3945986-A RING OPENING POLYMERIZATION, TUNGSTEN OR MOLYBDENUM HALIDE, ALKYL ALUMINUM HALIDE, ALCOHOL CATALYST THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-03-23 US disclosed
US-3935179-A TUNGSTEN HALIDE OR OXYHALIDE, AN ALKYL-ALUMINUM HALIDE, ALCOHOL CATALYST THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-01-27 US disclosed