SCHEMBL29397498

SCHEMBL29397498

Nc1cccc2cc(C(=O)O)ccc12

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.66
HSD17B10 Q99714 3/20 0.59
CYP2C9 P11712 1/20 0.59
ATIC P31939 1/20 0.59
CYP2C19 P33261 1/20 0.59
CDC25B P30305 5/20 0.49
CDC25A P30304 1/20 0.49
CDC25C P30307 1/20 0.49
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
F2 P00734 1/20 0.47
PLG P00747 1/20 0.47
PLAU P00749 1/20 0.47
PLAT P00750 1/20 0.47
KLK1 P06870 1/20 0.47
PRSS1 P07477 1/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA6 P23280 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL341301 1.00 PTPN1 (0.66) PTPN1HSD17B10CYP2C9ATICCYP2C19
SCHEMBL6869446 0.86 PTPN1 (0.54) PTPN1HSD17B10CYP2C9ATICCYP2C19
SCHEMBL689325 0.85 PLAU (0.66) PTPN1HSD17B10CYP2C9ATICCYP2C19
SCHEMBL30791056 0.85 PLAU (0.66) PTPN1HSD17B10CYP2C9ATICCYP2C19
Isophthalic Acid SCHEMBL27522273 0.84 HSD17B10 (0.61) PTPN1HSD17B10CYP2C9ATICCYP2C19
SCHEMBL31061825 0.81 PTPN1 (0.50) PTPN1HSD17B10CYP2C9ATICCYP2C19
SCHEMBL31357157 0.81 PTPN1 (0.70) PTPN1HSD17B10CYP2C19MEN1KMT2A
SCHEMBL2927283 0.80 LCK (0.56) HSD17B10CYP2C9ATICCYP2C19PLAU
3-Aminobenzoic Acid SCHEMBL8003488 0.80 HSD17B10 (0.55) HSD17B10CYP2C9ATICCYP2C19CDC25B
SCHEMBL186327 0.79 PTPN1 (0.68) PTPN1CDC25BMEN1KMT2APLAU

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4573154-A1 USE OF ADDITIVES FOR IMPROVING THE PROCESSING OF POLYETHYLENES BASF SE (DE) 2025-06-25 EP disclosed
WO-2025021592-A1 RECYCLING OF POLYOLEFIN WASTE BY ADDING A AMIDE CLARIFIER BASF SE (DE) 2025-01-30 WO disclosed
WO-2024053655-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-14 WO disclosed
WO-2024048435-A1 RESIN COMPOSITION, CURED ARTICLE, LAMINATE, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048604-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048605-A1 RESIN COMPOSITION, CURED PRODUCT, LAYERED BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAYERED BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048603-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048436-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024024833-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, CURED PRODUCT MANUFACTURING METHOD, LAMINATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, RESIN FILM, AND COMPOUND 富士フイルム株式会社 2024-02-01 WO disclosed
WO-2023243613-A1 COMPOSITION, THERMALLY CONDUCTIVE MATERIAL, DEVICE, AND PRODUCTION METHOD FOR MODIFIED INORGANIC PARTICLES 富士フイルム株式会社 2023-12-21 WO disclosed
WO-2022064933-A1 METHOD FOR PRODUCING COMPOSITE PATTERN, RESIN COMPOSITION, METHOD FOR PRODUCING MULTILAYER BODY, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-31 WO disclosed
WO-2022059621-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-24 WO disclosed
WO-2022059622-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-24 WO disclosed
WO-2022050041-A1 CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD 富士フイルム株式会社 2022-03-10 WO disclosed
WO-2022050135-A1 CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD 富士フイルム株式会社 2022-03-10 WO disclosed
WO-2022050278-A1 CURABLE RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, SEMICONDUCTOR DEVICE, AND PHOTOBASE GENERATOR 富士フイルム株式会社 2022-03-10 WO disclosed
WO-2022045124-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-03 WO disclosed
WO-2022045059-A1 RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-03 WO disclosed
WO-2022045120-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR MANUFACTURING CURED PRODUCT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-03 WO disclosed
WO-2022045060-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-03-03 WO disclosed