Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.66 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.59 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.59 |
| ▸ | ATIC | P31939 | 1/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.59 |
| ▸ | CDC25B | P30305 | 5/20 | 0.49 |
| ▸ | CDC25A | P30304 | 1/20 | 0.49 |
| ▸ | CDC25C | P30307 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | F2 | P00734 | 1/20 | 0.47 |
| ▸ | PLG | P00747 | 1/20 | 0.47 |
| ▸ | PLAU | P00749 | 1/20 | 0.47 |
| ▸ | PLAT | P00750 | 1/20 | 0.47 |
| ▸ | KLK1 | P06870 | 1/20 | 0.47 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.47 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | CA6 | P23280 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29397498 | 1.00 | PTPN1 (0.66) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| SCHEMBL6869446 | 0.86 | PTPN1 (0.54) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| SCHEMBL689325 | 0.85 | PLAU (0.66) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| SCHEMBL30791056 | 0.85 | PLAU (0.66) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| Isophthalic Acid SCHEMBL27522273 | 0.84 | HSD17B10 (0.61) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| SCHEMBL31061825 | 0.81 | PTPN1 (0.50) | PTPN1HSD17B10CYP2C9ATICCYP2C19 | |
| SCHEMBL31357157 | 0.81 | PTPN1 (0.70) | PTPN1HSD17B10CYP2C19MEN1KMT2A | |
| SCHEMBL2927283 | 0.80 | LCK (0.56) | HSD17B10CYP2C9ATICCYP2C19PLAU | |
| 3-Aminobenzoic Acid SCHEMBL8003488 | 0.80 | HSD17B10 (0.55) | HSD17B10CYP2C9ATICCYP2C19CDC25B | |
| SCHEMBL186327 | 0.79 | PTPN1 (0.68) | PTPN1CDC25BMEN1KMT2APLAU |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 680 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119781246-A | Photosensitive polyimide resin composition, cured film, and preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-115010924-A | Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-06 | — | — | CN | claimed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| CN-102863822-A | Hyperbranched macromolecule dispersing agent for dispersing dyes and preparation method thereof | UNIV SHAANXI SCIENCE & TECH | 2013-01-09 | — | — | CN | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122029489-A | Photosensitive resin composition, cured product, display device, and electronic component | 东丽株式会社 | 2026-05-12 | — | — | CN | disclosed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260003276-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2026-01-01 | — | — | US | disclosed |
| WO-1992013037-A1 | ANIONIC DISAZO DYES | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1992-08-06 | — | — | WO | disclosed |
| EP-0480705-A1 | Monoazo lake pigment, process for producing the same and its use | TOYO INK MANUFACTURING CO., LTD. (JP) | 1992-04-15 | — | — | EP | disclosed |
| US-5053495-A | For thermal ink jet printing | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1991-10-01 | — | — | US | disclosed |
| CN-1046528-A | As the new naphthalane base-3H-1 of antihyperglycemic agents, 2,3,5-oxygen thia diazole 2-oxide compound | AMERICAN HOME PROD (US) | 1990-10-31 | — | — | CN | disclosed |
| US-4966975-A | Processes for the preparation of novel naphthalenylmethyl-3H-1,2,3,5-oxathiadiazole 2-oxides useful as antihyperglycemic agents | AMERICAN HOME PRODUCT | 1990-10-30 | — | — | US | disclosed |
| EP-0393941-A1 | Naphthalene derivatives | AMERICAN HOME PRODUCTS CORPORATION (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0356080-A2 | Anionic dye | ZENECA LIMITED (GB) | 1990-02-28 | — | — | EP | disclosed |
| US-4897405-A | Novel naphthalenylalkyl-3H-1,2,3,5-oxathiadiazole 2-oxides useful as antihyperglycemic agents | AMERICAN HOME PRODUCTS CORPORATION (US) | 1990-01-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | PTPN1 2077/4885HSD17B10 4284/4885CYP2C9 2081/4885 |
| US-20260003276-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | RER1, SEM1, RAD51 | PTPN1 2284/4885HSD17B10 3559/4885CYP2C9 1493/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | PTPN1 923/4885HSD17B10 4119/4885CYP2C9 3892/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.