Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 4/20 | 0.45 |
| ▸ | CNR2 | P34972 | 4/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | HTR1B | P28222 | 4/20 | 0.40 |
| ▸ | THRA | P10827 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | HTR1D | P28221 | 2/20 | 0.38 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL106524 | 1.00 | CNR1 (0.45) | CNR1CNR2GAATDP1L3MBTL1 | |
| Bromide SCHEMBL2194103 | 0.99 | CNR1 (0.44) | CNR1CNR2GAATDP1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL31108778 | 0.99 | CNR1 (0.44) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL3454520 | 0.96 | CNR2 (0.42) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL2742104 | 0.94 | CNR1 (0.47) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL8736285 | 0.94 | CNR1 (0.47) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL8737935 | 0.94 | CNR1 (0.47) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL31040506 | 0.93 | CNR1 (0.44) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL702260 | 0.93 | CNR1 (0.44) | CNR1CNR2GAATDP1L3MBTL1 | |
| SCHEMBL13088093 | 0.91 | HTR1B (0.43) | CNR1CNR2GAATDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4674837-A1 | HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-20250147418-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2025-05-08 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-119330866-A | A photoacid generator Photoresist composition comprising the same | 湖北鼎龙控股股份有限公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| WO-2024181541-A1 | HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE | 東京応化工業株式会社 | 2024-09-06 | — | — | WO | disclosed |
| CN-118511127-A | Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article | JSR株式会社 | 2024-08-16 | — | — | CN | disclosed |
| CN-110073476-B | Thin film transistor substrate having protective film and method for manufacturing the same | 默克专利有限公司 | 2023-09-01 | — | — | CN | disclosed |
| WO-2023157801-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2023-08-24 | — | — | WO | disclosed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | disclosed |
| WO-2022091731-A1 | METAL COMPLEX, COMPOSITION, RESIST MATERIAL, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | DIC株式会社 | 2022-05-05 | — | — | WO | disclosed |
| WO-2022065374-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | 日産化学株式会社 | 2022-03-31 | — | — | WO | disclosed |