Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.45 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.45 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.36 |
| ▸ | BAZ2B | Q9UIF8 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL872231 | 1.00 | POLB (0.53) | POLBLMNAGABRG2GABRB3GABRA5 | |
| SCHEMBL1689491 | 0.91 | POLB (0.70) | POLBLMNAGABRG2GABRB3GABRA5 | |
| SCHEMBL9982710 | 0.84 | POLB (0.53) | POLBLMNAGABRG2GABRB3GABRA5 | |
| SCHEMBL28465025 | 0.76 | POLB (0.53) | POLBLMNAALDH1A1KDM4EHPGD | |
| SCHEMBL29865552 | 0.76 | BAZ2B (0.56) | POLBLMNAALDH1A1KDM4EHPGD | |
| SCHEMBL10064601 | 0.75 | GABRG2 (0.72) | GABRG2GABRB3GABRA5DNMT1 | |
| SCHEMBL4848329 | 0.74 | SRC (0.60) | LMNAALDH1A1HPGDDNMT1MAPT | |
| SCHEMBL6378148 | 0.73 | NOTUM (0.38) | POLBALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL29582349 | 0.72 | POLB (0.48) | POLBLMNAGABRG2GABRB3GABRA5 | |
| SCHEMBL21122012 | 0.72 | POLB (0.48) | POLBLMNAGABRG2GABRB3GABRA5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025137293-A2 | ENHANCEMENT OF NUCLEIC ACID POLYMERIZATION BY AROMATIC COMPOUNDS | Roche Sequencing Solutions, Inc. (US) | 2025-06-26 | — | — | WO | disclosed |
| CN-119823106-A | Enhanced nucleic acid polymerization by aromatic compounds | 豪夫迈·罗氏有限公司 | 2025-04-15 | — | — | CN | disclosed |
| CN-119631160-A | Stripping agent composition for light irradiation stripping, laminate, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2025-03-14 | — | — | CN | disclosed |
| US-20250043176-A1 | ORGANIC ELECTROLUMINESCENT MATERIALS CONTAINING PYRENE GROUP AND ORGANIC LIGHT-EMITTING DIODES USING THE SAME | YUAN ZE UNIVERSITY (TW) | 2025-02-06 | — | — | US | disclosed |
| CN-114144520-B | Enhanced nucleic acid polymerization by aromatic compounds | 豪夫迈·罗氏有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-111771001-B | Enhanced nucleic acid polymerization by aromatic compounds | F·霍夫曼-罗氏股份公司 | 2024-09-06 | — | — | CN | disclosed |
| CN-118507421-A | Laminate containing novolac resin as release layer | 日产化学株式会社 | 2024-08-16 | — | — | CN | disclosed |
| CN-111316401-B | Laminate containing novolac resin as release layer | 日产化学株式会社 | 2024-08-02 | — | — | CN | disclosed |
| CN-117882172-A | Adhesive composition, laminate, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2024-04-12 | — | — | CN | disclosed |
| CN-109075060-B | Method for manufacturing semiconductor substrate having group III nitride compound layer | 日产化学株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-117716474-A | Method for producing laminate and kit of adhesive composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-116997861-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-116635442-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116235112-A | Composition for forming resist underlayer film comprising fluoroalkyl group-containing organic acid or salt thereof | 日产化学株式会社 | 2023-06-06 | — | — | CN | disclosed |
| CN-116157898-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-05-23 | — | — | CN | disclosed |
| WO-2022065374-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | 日産化学株式会社 | 2022-03-31 | — | — | WO | disclosed |
| CN-114144520-A | Enhanced nucleic acid polymerization by aromatic compounds | 斯特拉托斯基因公司 | 2022-03-04 | — | — | CN | disclosed |