Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | ALPG | P10696 | 1/20 | 0.40 |
| ▸ | RHEB | Q15382 | 1/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.39 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.39 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | PDE7A | Q13946 | 1/20 | 0.38 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1127635 | 1.00 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL30044516 | 0.97 | BCL2L1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL30044521 | 0.97 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL30044071 | 0.97 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL2526984 | 0.97 | BCL2L1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| Perchlorate SCHEMBL30044641 | 0.96 | BCL2L1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| Perchlorate SCHEMBL2530063 | 0.96 | BCL2L1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL29771050 | 0.95 | ALDH1A1 (0.42) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL30043771 | 0.94 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1GLAHPGDLMNA | |
| SCHEMBL7112406 | 0.94 | BCL2L1 (0.37) | ALDH1A1L3MBTL1GLAHPGDLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| WO-2025023159-A1 | PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION | ナミックス株式会社 | 2025-01-30 | — | — | WO | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-118369596-A | Resin composition for lens, cured product for lens, and lens | 三井化学株式会社 | 2024-07-19 | — | — | CN | disclosed |
| CN-117586478-A | Curable composition, cured product thereof, and wafer level lens | 株式会社大赛璐 | 2024-02-23 | — | — | CN | disclosed |
| CN-117590696-A | Photosensitive resin composition | 东京应化工业株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-110647010-B | Resin composition, dry film, method for producing dry film, resist film, substrate, and method for producing plating molded article | 东京应化工业株式会社 | 2024-02-09 | — | — | CN | disclosed |
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-114967342-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-110999537-B | Sealing agent for organic electroluminescent element | 电化株式会社 | 2022-08-26 | — | — | CN | disclosed |
| CN-114902134-A | Chemically amplified photosensitive composition, photosensitive dry film and method for producing same, method for producing resist film, and acid diffusion inhibitor | 东京应化工业株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114868081-A | Photosensitive resin composition, dry film and method for producing same, resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-05 | — | — | CN | disclosed |
| WO-2022145158-A1 | PHOTOSENSITIVE DRY FILM, LAYERED FILM, METHOD FOR PRODUCING LAYERED FILM, AND METHOD FOR PRODUCING PATTERNED RESIST FILM | 東京応化工業株式会社 | 2022-07-07 | — | — | WO | disclosed |
| CN-114641727-A | Method for producing photosensitive composition, premix for production, photosensitive composition, dry film, and method for producing resist film | 东京应化工业株式会社 | 2022-06-17 | — | — | CN | disclosed |
| CN-114502613-A | Curable composition, cured product, and method for forming cured product | 东京应化工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-114401975-A | Novel onium salt and photoacid generator | 三亚普罗股份有限公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-114207524-A | Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-108885397-B | Surface treatment method and surface treatment liquid | 东京应化工业株式会社 | 2022-03-01 | — | — | CN | disclosed |