⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1325042 | 0.75 | — | — | |
| SCHEMBL571339 | 0.73 | — | — | |
| SCHEMBL571338 | 0.71 | — | — | |
| Ammonia Solution, Strong SCHEMBL26679457 | 0.71 | — | — | |
| SCHEMBL3242789 | 0.71 | — | — | |
| SCHEMBL30637135 | 0.69 | — | — | |
| SCHEMBL29449277 | 0.69 | — | — | |
| SCHEMBL60099 | 0.67 | — | — | |
| SCHEMBL7058455 | 0.67 | — | — | |
| SCHEMBL11342984 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| CN-119278503-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| CN-119278504-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| WO-2024248021-A1 | FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | disclosed |
| CN-118451534-A | Film-forming composition and method for producing substrate | 中央硝子株式会社 | 2024-08-06 | — | — | CN | disclosed |
| WO-2024143097-A1 | SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2023234370-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| WO-2023234368-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| US-11817310-B2 | Bevel portion treatment agent composition and method of manufacturing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| WO-2023127942-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | セントラル硝子株式会社 | 2023-07-06 | — | — | WO | disclosed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| US-11282709-B2 | Chemical agent for forming water repellent protective film and surface treatment method for wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |