Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR5A1 | Q13285 | 1/20 | 0.67 |
| ▸ | LTA4H | P09960 | 2/20 | 0.62 |
| ▸ | ESR1 | P03372 | 5/20 | 0.54 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.54 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.54 |
| ▸ | TACR2 | P21452 | 2/20 | 0.54 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.54 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.54 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | SHBG | P04278 | 1/20 | 0.54 |
| ▸ | TP53 | P04637 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.54 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.54 |
| ▸ | HTR2C | P28335 | 1/20 | 0.54 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.54 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydroquinone SCHEMBL4636167 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL3891638 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL2944714 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL2946399 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL10845593 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL2945404 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL4635427 | 0.98 | NR5A1 (0.70) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Hydroquinone SCHEMBL700283 | 0.93 | LTA4H (0.63) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| SCHEMBL9731932 | 0.90 | NR5A1 (0.56) | NR5A1LTA4HESR1ADRA2AADORA3 | |
| Phenol SCHEMBL27291071 | 0.89 | NR5A1 (0.55) | NR5A1LTA4HESR1ADRA2AADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250333555-A1 | COMPOSITION AND METHOD FOR PRODUCING ARTICLE | CANON KK (JP) | 2025-10-30 | — | — | US | disclosed |
| US-20250257221-A1 | PHOTOCURABLE RESIN COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12291648-B2 | Energy ray-curable resin compositions and its cured products | CANON KABUSHIKI KAISHA (JP) | 2025-05-06 | — | — | US | disclosed |
| WO-2024090478-A1 | PHOTOCURABLE RESIN COMPOSITION | キヤノン株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-11834539-B2 | Photocurable material composition, cured product of photocurable material composition and manufacturing method thereof | CANON KABUSHIKI KAISHA (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11673983-B2 | Photocurable resin composition and a method for producing an article | CANON KABUSHIKI KAISHA (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11667741-B2 | Photocurable resin composition | CANON KABUSHIKI KAISHA (JP) | 2023-06-06 | — | — | US | disclosed |
| US-11548959-B2 | Photocurable material composition and cured product thereof | CANON KABUSHIKI KAISHA (JP) | 2023-01-10 | — | — | US | disclosed |
| CN-111205394-B | Photocurable material composition and cured product thereof | 佳能株式会社 | 2022-12-30 | — | — | CN | disclosed |
| US-20220282020-A1 | PHOTOCURABLE MATERIAL COMPOSITION, CURED PRODUCT OF PHOTOCURABLE MATERIAL COMPOSITION AND MANUFACTURING METHOD THEREOF | CANON KABUSHIKI KAISHA (JP) | 2022-09-08 | — | — | US | disclosed |
| EP-1476786-B1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE USING THE SAME | KODAK GRAPHIC COMM JAPAN LTD (JP) | 2010-01-06 | — | — | EP | disclosed |
| US-20050038224-A1 | Polyester | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-6824947-B2 | FORMED FROM A PHENOL AND DIMETHYLOLUREA; PLANOGRAPHIC PRINTING PLATE PRECURSORS TO FORM PLATES THAT EXHIBIT GOOD DURABILITY, GOOD EXPOSURE VISUAL IMAGE PROPERTY, AND GOOD SOLVENT RESISTANCE ESPECIALLY TO WASHING OIL USED IN UV INK | KODAK POLYCHROME GRAPHICS, LLC | 2004-11-30 | — | — | US | disclosed |
| EP-1476786-A2 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE USING THE SAME | Kodak Polychrome Graphics Japan Ltd. (JP) | 2004-11-17 | — | — | EP | disclosed |
| EP-1477505-A1 | POLYESTER | Kyowa Hakko Chemical Co., Ltd. (JP) | 2004-11-17 | — | — | EP | disclosed |
| US-20030224281-A1 | Photosensitive composition comprising a phenol resin having a urea bond in the main chain | BANK OF AMERICA, N.A., AS AGENT | 2003-12-04 | — | — | US | disclosed |
| WO-2003071355-A2 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE USING THE SAME | KODAK POLYCHROME GRAPHICS JAPAN LTD. (JP) | 2003-08-28 | — | — | WO | disclosed |
| US-4631252-A | PHOTOGRAPHIC STABILIZERS | CIBA-GEIGY AG (CH) | 1986-12-23 | — | — | US | disclosed |
| US-4616082-A | PHOTOGRAPHIC STABILIZERS | CIBA-GEIGY AG (CH) | 1986-10-07 | — | — | US | disclosed |
| US-4549015-A | PHOTOHRAPHIC STABILIZERS | CIBA-GEIGY AG (CH) | 1985-10-22 | — | — | US | disclosed |