SCHEMBL2947050

SCHEMBL2947050

CC(C)(c1ccccc1)c1ccc(O)c(C(C)(C)c2ccccc2)c1.CCCCC(CC)(CO)COP(O)O

nearest known ligand 0.33

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.33
ESR2 Q92731 4/20 0.33
CNR1 P21554 3/20 0.32
CNR2 P34972 3/20 0.32
KLF10 Q13118 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CYP3A4 P08684 1/20 0.32
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
LMNA P02545 1/20 0.31
POLB P06746 1/20 0.31
KMT2A Q03164 1/20 0.31
HSP90AA1 P07900 1/20 0.31
HSP90AB1 P08238 1/20 0.31
RORC P51449 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2947056 0.90 ESR1 (0.37) ESR1ESR2CNR1CNR2KLF10
SCHEMBL2947054 0.83 KDM4E (0.30) KDM4EMEN1LMNAPOLBKMT2A
SCHEMBL2947052 0.81 MEN1 (0.32) ESR1ESR2ALDH1A1CYP3A4KDM4E
SCHEMBL2951541 0.76 NR5A2 (0.42) ALDH1A1CYP3A4MEN1LMNAPOLB
SCHEMBL6231242 0.73
SCHEMBL745012 0.72 ESR1 (0.59) ESR1ESR2CNR1CNR2KLF10
SCHEMBL29547368 0.72 ESR1 (0.59) ESR1ESR2CNR1CNR2KLF10
Butylated Hydroxytoluene SCHEMBL2952153 0.72 CA2 (0.43) ALDH1A1CYP3A4MEN1LMNAPOLB
SCHEMBL8444021 0.71 ESR1 (0.50) ESR1ESR2CNR1CNR2KLF10
SCHEMBL11208833 0.71 CNR1 (0.48) ESR1ESR2CNR1CNR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4251690-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2023-10-04 EP claimed
CN-116745353-A Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure 塞特工业公司 2023-09-12 CN claimed
WO-2023129464-A1 POLYMER COMPOSITIONS HAVING DENSIFICATION ACCELERATORS AND ROTATIONAL MOLDING PROCESSES FOR MAKING HOLLOW ARTICLES THEREFROM CYTEC INDUSTRIES INC. (US) 2023-07-06 WO claimed
EP-2864310-B1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE CYTEC TECH CORP (US) 2022-10-26 EP claimed
US-20220212375-A1 POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING CYTEC TECHNOLOGY CORP. 2022-07-07 US claimed
WO-2022115578-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
US-20220169829-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 US claimed
US-20220153959-A1 POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM CYTEC TECHNOLOGY CORP. 2022-05-19 US claimed
CN-110669255-B Stabilizer compositions containing substituted chroman compounds and methods of use thereof 塞特克技术公司 2021-09-14 CN claimed
US-10975278-B2 Granular stabilizer compositions for use in polymer resins and methods of making same CYTEC INDUSTRIES INC. (US) 2021-04-13 US claimed
CN-110669255-A Stabilizer compositions containing substituted chroman compounds and methods of use thereof 塞特克技术公司 2020-01-10 CN claimed
US-20190264084-A1 GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME CYTEC INDUSTRIES INC. (US) 2019-08-29 US claimed
EP-2652014-A2 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING Cytec Technology Corp. (US) 2013-10-23 EP claimed
US-20130145962-A1 Stabilizer Compositions Containing Substituted Chroman Compounds and Methods of Use CYTEC TECHNOLOGY CORP. (US) 2013-06-13 US claimed
WO-2012082578-A2 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECHNOLOGY CORP. (US) 2012-06-21 WO claimed
US-20120146257-A1 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECHNOLOGY CORP. (US) 2012-06-14 US claimed
US-20100256266-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2010-10-07 US claimed
US-7759417-B2 Stabilizer compositions CYTEC TECHNOLOGY CORP. (US) 2010-07-20 US claimed
US-20090149581-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2009-06-11 US claimed
WO-2007136565-A1 STABILIZER COMPOSITIONS CYTEC TECHNOLOGY CORP. (US) 2007-11-29 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220212375-A1 POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING RPS7, MRPS27, F7 ESR1 4567/4885ESR2 4487/4885CNR1 4767/4885
US-20220153959-A1 POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM NOTUM, PMM2, WASF2 ESR1 4174/4885ESR2 4429/4885CNR1 4640/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.