SCHEMBL2948104

SCHEMBL2948104

CC(C)O[Si](O)(OC(C)C)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22471990 0.83
SCHEMBL17522115 0.78
SCHEMBL11242057 0.77
SCHEMBL258140 0.77
Acrylic Acid SCHEMBL28544881 0.77 LMNA (0.46)
Methacrylic Acid SCHEMBL28548102 0.77 TSHR (0.34)
SCHEMBL4631886 0.76
SCHEMBL4631253 0.76
SCHEMBL27487111 0.76
SCHEMBL16404435 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 228 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12571093-B2 Selective deposition of silicon oxide on metal surfaces ASM IP HOLDING B.V. (NL) 2026-03-10 US claimed
CN-113463067-B Selective deposition of silicon oxide on metal surfaces ASM IP私人控股有限公司 2025-05-23 CN claimed
CN-119650422-A Method for forming metal silicate layer for controlling threshold voltage ASM IP私人控股有限公司 2025-03-18 CN claimed
US-12252452-B2 Coatings on particles of high energy materials and methods of forming same Forge Nano, Inc. (US) 2025-03-18 US claimed
US-20250087478-A1 METHODS FOR FORMING A METAL SILICATE LAYER FOR CONTROLLING A THRESHOLD VOLTAGE OF A METAL-OXIDE-SEMICONDUCTOR FIELD EFFECT TRANSISTOR ASM IP HOLDING B.V. (NL) 2025-03-13 US claimed
US-20240076775-A1 SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES ASM IP HOLDING B.V. (NL) 2024-03-07 US claimed
US-11898240-B2 Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces ASM IP HOLDING B.V. (NL) 2024-02-13 US claimed
US-11643720-B2 Selective deposition of silicon oxide on metal surfaces ASM IP HOLDING B.V. (NL) 2023-05-09 US claimed
US-20220349041-A1 EROSION RESISTANT METAL SILICATE COATINGS APPLIED MATERIALS, INC. 2022-11-03 US claimed
CN-113463067-A Selective deposition of silicon oxide on metal surfaces ASM IP私人控股有限公司 2021-10-01 CN claimed
US-20080057425-A1 Silanol containing perylene photoconductors XEROX CORPORATION 2008-03-06 US claimed
US-20080057423-A1 Titanyl phthalocyanine silanol terphenyl photoconductors XEROX CORPORATION 2008-03-06 US claimed
US-20080057421-A1 Silanol containing perylene photoconductors XEROX CORPORATION 2008-03-06 US claimed
US-20080057422-A1 Titanyl phthalocyanine silanol photoconductors XEROX CORPORATION 2008-03-06 US claimed
US-20080032218-A1 Silanol containing photoconductor XEROX CORPORATION 2008-02-07 US claimed
US-20080020312-A1 Imaging member having antistatic anticurl back coating XEROX CORPORATION (US) 2008-01-24 US claimed
US-20080014516-A1 Silanol containing photoconductors XEROX CORPORATION 2008-01-17 US claimed
US-20080014517-A1 Silanol containing photoconductors XEROX CORPORATION. 2008-01-17 US claimed
US-20060216548-A1 Nanolaminate thin films and method for forming the same using atomic layer deposition UDC IRELAND LIMITED (IE) 2006-09-28 US claimed
US-4338133-A Jet printing ink composition DAI NIPPON TORYO CO., LTD. (JP) 1982-07-06 US claimed