SCHEMBL29482425

SCHEMBL29482425

CC(C)(C)OC(=O)OC(=O)OC(C)(C)C.[W]

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.40
ELANE P08246 1/20 0.40
USP2 O75604 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HDAC6 Q9UBN7 2/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
SOAT1 P35610 1/20 0.35
ALDH1A1 P00352 2/20 0.32
TDP1 Q9NUW8 1/20 0.31
HPGD P15428 1/20 0.31
CHRM2 P08172 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA7 P43166 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8375577 0.97 DGAT1 (0.42) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL5452 0.97 DGAT1 (0.42) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL1145251 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
Ammonia Solution, Strong SCHEMBL28101892 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL28239854 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL31469549 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL29740062 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
Hydrochloric Acid SCHEMBL28367906 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
SCHEMBL29808062 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6
Methyl Alcohol SCHEMBL27831808 0.94 DGAT1 (0.40) DGAT1ELANEUSP2SMN1; SMN2HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022044893-A1 PROCESSING LIQUID, METHOD FOR PROCESSING SUBSTRATE 富士フイルム株式会社 2022-03-03 WO disclosed