SCHEMBL2953068

SCHEMBL2953068

CCCO[Si](C)(C)O[Si](C)(C)OCCC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23701327 0.97
SCHEMBL26676531 0.88
SCHEMBL5458703 0.88
SCHEMBL5465821 0.88
SCHEMBL16476594 0.87 HSD17B10 (0.30) HSD17B10
SCHEMBL106001 0.87
SCHEMBL2950195 0.86
SCHEMBL16476603 0.85
SCHEMBL27097896 0.83
SCHEMBL2950261 0.82 TSHR (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210066075-A1 STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME ASM IP HOLDING B.V. (NL) 2021-03-04 US claimed
US-20230386825-A1 ALKOXYDISILOXANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC 2023-11-30 US disclosed
US-20230386825-A1 ALKOXYDISILOXANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC 2023-11-30 US disclosed
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
US-20210066075-A1 STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME ASM IP HOLDING B.V. (NL) 2021-03-04 US disclosed
US-20100233482-A1 Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device HAMADA YOSHITAKA 2010-09-16 US disclosed
US-7754330-B2 Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-13 US disclosed
US-20090294726-A1 ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE PANASONIC CORPORATION (JP) 2009-12-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230386825-A1 ALKOXYDISILOXANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM WASF2, ORMDL3, WEE2 HSD17B10 3510/4885
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SPOP, OSTC, SEM1 HSD17B10 3777/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.