SCHEMBL295339

SCHEMBL295339

CC[n+]1cccc(CO)c1

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.41
KDM4E B2RXH2 3/20 0.38
PKM P14618 1/20 0.36
APOBEC3A P31941 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.36
GGPS1 O95749 2/20 0.35
NPSR1 Q6W5P4 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
CHKA P35790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29388199 1.00 TSHR (0.41) TSHRKDM4EPKMAPOBEC3AAPOBEC3G
Water SCHEMBL15375414 0.98 TSHR (0.39) TSHRKDM4EPKMAPOBEC3AAPOBEC3G
Sulfuric Acid SCHEMBL29203158 0.93 KDM4E (0.38) TSHRKDM4EPKMAPOBEC3AAPOBEC3G
Sulfuric Acid SCHEMBL29203159 0.91 KDM4E (0.37) TSHRKDM4EPKMAPOBEC3AAPOBEC3G
SCHEMBL15915666 0.84 TDP1 (0.45) KDM4EPKMAPOBEC3AAPOBEC3GLMNA
SCHEMBL29724065 0.84 TDP1 (0.45) KDM4EPKMAPOBEC3AAPOBEC3GLMNA
SCHEMBL193561 0.83 GGPS1 (0.34) KDM4ELMNAGGPS1
SCHEMBL29388369 0.83 GGPS1 (0.34) KDM4ELMNAGGPS1
SCHEMBL514918 0.83 TP53 (0.50) KDM4EPKMAPOBEC3AAPOBEC3GLMNA
SCHEMBL21490429 0.83 TSHR (0.44) TSHRKDM4ELMNANPSR1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4470972-A1 PROCESS FOR PRODUCING ONIUM SALTS OF BIS(FLUOROSULFONYL)IMIDE SPECIALTY OPERATIONS FRANCE (FR) 2024-12-04 EP claimed
CN-119059497-A Process for the production of onium salts of bis (fluorosulfonyl) imide 法国特种经营公司 2024-12-03 CN claimed
CN-114262917-A Electrolytic nickel (alloy) plating solution 日本高纯度化学株式会社 2022-04-01 CN claimed
US-20190330753-A1 NICKEL (ALLOY) ELECTROPLATING SOLUTION JAPAN PURE CHEMICAL CO., LTD. (JP) 2019-10-31 US claimed
US-8492538-B1 Cyclodextrin derivative salts MATOS JOSE R (US) 2013-07-23 US claimed
EP-2276917-B1 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES BOSCH GMBH ROBERT (DE) 2012-03-14 EP claimed
EP-2276917-A2 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES Robert Bosch GmbH (DE) 2011-01-26 EP claimed
WO-2009138296-A2 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES ROBERT BOSCH GMBH (DE) 2009-11-19 WO claimed
EP-1971666-A1 PROCESS FOR THE SYNTHESIS OF NANOCRYSTALLINE PHOSPHOR PARTICLES AND NANOCRYSTALLINE PHOSPHOR PARTICLES OBTAINABLE BY THIS PROCESS UNIVERSITÄT KARLSRUHE (DE) 2008-09-24 EP claimed
WO-2007082663-A1 PROCESS FOR THE SYNTHESIS OF NANOCRYSTALLINE PHOSPHOR PARTICLES AND NANOCRYSTALLINE PHOSPHOR PARTICLES OBTAINABLE BY THIS PROCESS UNIVERSITÄT KARLSRUHE (DE) 2007-07-26 WO claimed
US-20260118757-A1 RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-04-30 US disclosed
US-20250129487-A1 PRODUCTION METHOD FOR AMMONIA AND PRODUCTION DEVICE NISSAN CHEMICAL CORPORATION (JP) 2025-04-24 US disclosed
EP-4470972-A1 PROCESS FOR PRODUCING ONIUM SALTS OF BIS(FLUOROSULFONYL)IMIDE SPECIALTY OPERATIONS FRANCE (FR) 2024-12-04 EP disclosed
CN-119059497-A Process for the production of onium salts of bis (fluorosulfonyl) imide 法国特种经营公司 2024-12-03 CN disclosed
US-20240383752-A1 REACTIVE DISTILLATION PROCESS FOR PREPARING FLUOROSULFONYLIMIDE SALTS SPECIALTY OPERATIONS FRANCE (FR) 2024-11-21 US disclosed
EP-0693708-A1 Silver halide photographic element and process for the formation of high contrast negative images MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-24 EP disclosed
US-5130480-A In silver halide elements; images with ultrahigh contrast; reprography, photo typesetting, photomasks E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-07-14 US disclosed
US-5013844-A Photographic emulsions, high contrast E. I. DU PONT DE NEMOURS AND COMPANY (US) 1991-05-07 US disclosed
US-4937160-A High contrast E. I. DU PONT DE NEMOURS AND COMPANY (US) 1990-06-26 US disclosed
EP-0356898-A2 Silver halide photographic materials containing aryl hydrazides DU PONT DE NEMOURS (DEUTSCHLAND) GMBH (DE) 1990-03-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118757-A1 RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME SLC39A14, HCN4, SLC11A2 TSHR 897/4885KDM4E 2974/4885PKM 1215/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.