SCHEMBL29568643

SCHEMBL29568643

O=C(O)C1CCc2ccccc2C1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.47
CYP2D6 P10635 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
HIF1A Q16665 1/20 0.47
TSHR P16473 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
PIN1 Q13526 2/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
CYP11B2 P19099 1/20 0.42
HTT P42858 1/20 0.42
EPHX2 P34913 2/20 0.42
IDO1 P14902 1/20 0.41
PDPK1 O15530 1/20 0.41
ACP3 P15309 1/20 0.41
EPHX1 P07099 1/20 0.40
KEAP1 Q14145 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL901095 1.00 CYP1A2 (0.47) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL7901109 1.00 CYP1A2 (0.47) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
Succinic Acid SCHEMBL139964 0.92 HTR2C (0.45) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL9005881 0.87 CYP1A2 (0.43) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL14226877 0.82 CYP1A2 (0.47) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL8055209 0.82 CYP1A2 (0.47) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL8037310 0.82 CYP1A2 (0.47) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL8533978 0.82 TSHR (0.46) CYP1A2CYP2D6CYP2C9CYP2C19TSHR
SCHEMBL7891742 0.81 MEN1 (0.44) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL7891735 0.81 MEN1 (0.44) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116063686-B Alcohol-scratch-resistant transparent nylon and preparation method thereof 万华化学集团股份有限公司 2024-06-25 CN claimed
CN-116063686-A Alcohol-scratch-resistant transparent nylon and preparation method thereof 万华化学集团股份有限公司 2023-05-05 CN claimed
CN-114656767-B Active energy ray-curable resin composition, cured product, and article DIC株式会社 2025-06-10 CN disclosed
CN-116063686-B Alcohol-scratch-resistant transparent nylon and preparation method thereof 万华化学集团股份有限公司 2024-06-25 CN disclosed
CN-107533259-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2024-06-21 CN disclosed
CN-115052930-B Resin composition, laminate, method for producing same, electrode, secondary battery, and electric double layer capacitor 东丽株式会社 2024-06-18 CN disclosed
CN-112105991-B Pattern forming material, cured film, and method for producing cured pattern DIC株式会社 2024-05-28 CN disclosed
CN-114531881-B Acid group-containing (meth) acrylate resin and composition thereof DIC株式会社 2024-05-10 CN disclosed
CN-117567225-A Method for preparing dicarboxylic acid compound from olefin 徐州医科大学 2024-02-20 CN disclosed
CN-116063686-A Alcohol-scratch-resistant transparent nylon and preparation method thereof 万华化学集团股份有限公司 2023-05-05 CN disclosed
WO-2022137591-A1 METHOD FOR PRODUCING (METH)ACRYLATE RESIN DIC株式会社 2022-06-30 WO disclosed
WO-2022138184-A1 ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, CURED PRODUCT, INSULATION MATERIAL AND RESIST MEMBER DIC株式会社 2022-06-30 WO disclosed
WO-2022107508-A1 (METH)ACRYLATE RESIN HAVING ACID GROUP, CURABLE RESIN COMPOSITION, CURED PRODUCT, INSULATING AMTERIAL AND RESIST MEMBER DIC株式会社 2022-05-27 WO disclosed
WO-2022071286-A1 LIQUID-CRYSTAL COMPOSITION, LIQUID-CRYSTAL DISPLAY ELEMENT PRODUCTION METHOD, AND LIQUID-CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2022-04-07 WO disclosed