Known targets — ChEMBL curated mechanism
ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4
The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2C known ✓ | P28335 | 1/20 | 0.45 |
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.38 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.40 |
| ▸ | ACE | P12821 | 1/20 | 0.40 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.39 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29568643 | 0.92 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL7901109 | 0.92 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL901095 | 0.92 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL1193893 | 0.80 | CYP1A2 (0.39) | HTR2CSLC6A3GAAL3MBTL1CYP1A2 | |
| SCHEMBL9005881 | 0.80 | CYP1A2 (0.43) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL11064768 | 0.77 | EPHX2 (0.44) | HTR2CSLC6A3CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL8055209 | 0.76 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL8037310 | 0.76 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL14226877 | 0.76 | CYP1A2 (0.47) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL8533978 | 0.76 | TSHR (0.46) | CYP1A2CYP2D6CYP2C9CYP2C19TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1329769-B1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | NISSAN CHEMICAL IND LTD (JP) | 2011-04-27 | — | — | EP | claimed |
| US-20040048188-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-11 | — | — | US | claimed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | claimed |
| EP-0540829-B1 | Novel liquid crystal alignment treating agent | NISSAN CHEMICAL IND LTD (JP) | 1997-02-26 | — | — | EP | claimed |
| US-4695613-A | EPOXY RESIN, CYCLIC AMIDINE NEUTRALIZED OLIGOESTER | HUELS AKTIENGESELLSCHAFT (DE) | 1987-09-22 | — | — | US | claimed |
| JP-61243863-A | — | — | None | — | — | JP | disclosed |
| JP-61155448-A | — | — | None | — | — | JP | disclosed |
| CN-116997854-A | Liquid crystal composition, method for manufacturing liquid crystal display element, and liquid crystal display element | 日产化学株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-116507968-A | Radical generating film forming composition, radical generating film, method for manufacturing liquid crystal display element, and liquid crystal display element | 日产化学株式会社 | 2023-07-28 | — | — | CN | disclosed |
| US-10100254-B2 | Liquid crystal alignment agent and liquid crystal alignment film and liquid crystal display element formed from the liquid crystal alignment agent | CHI MEI CORPORATION (TW) | 2018-10-16 | — | — | US | disclosed |
| US-10100255-B2 | Liquid crystal alignment agent and liquid crystal alignment film and liquid crystal display element formed from the liquid crystal alignment agent | CHI MEI CORPORATION (TW) | 2018-10-16 | — | — | US | disclosed |
| US-10082704-B2 | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display element having thereof | CHI MEI CORPORATION (TW) | 2018-09-25 | — | — | US | disclosed |
| EP-1632291-A1 | HETEROGENEOUS CATALYST AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | Nissan Chemical Industries, Ltd. (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-20040224163-A1 | Thermally-conductive epoxy resin molded article and method of producing the same | POLYMATECH CO., LTD. | 2004-11-11 | — | — | US | disclosed |
| US-6187435-B1 | FOR REINFORCEMENT OF PLASTICS, CEMENTS; IN TEXTILES FOR WARPS; TENSILE STRENGTH, WEAR RESISTANCE | VERTROTEX FRANCE (FR) | 2001-02-13 | — | — | US | disclosed |
| EP-0575986-B1 | Agent for vertical orientation treatment of liquid crystal molecules | NISSAN CHEMICAL IND LTD (JP) | 1999-11-03 | — | — | EP | disclosed |
| US-5422419-A | Agent for alignment treatment for a liquid crystal cell | NISSAN CHEMICAL INDSTRIES LTD. (JP) | 1995-06-06 | — | — | US | disclosed |
| US-4695613-A | EPOXY RESIN, CYCLIC AMIDINE NEUTRALIZED OLIGOESTER | HUELS AKTIENGESELLSCHAFT (DE) | 1987-09-22 | — | — | US | disclosed |
| JP-S61243863-A | WATER-BASED POLYESTER RESIN PAINT COMPOSITION | NEW JAPAN CHEM CO LTD | 1986-10-30 | — | — | JP | disclosed |
| JP-S61155448-A | AQUEOUS POLYIMIDE RESIN COMPOSITION | NEW JAPAN CHEM CO LTD | 1986-07-15 | — | — | JP | disclosed |