⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2958335 | 1.00 | — | — | |
| SCHEMBL26953021 | 0.96 | — | — | |
| SCHEMBL628831 | 0.96 | — | — | |
| SCHEMBL834079 | 0.92 | — | — | |
| SCHEMBL14865745 | 0.89 | — | — | |
| SCHEMBL2950549 | 0.87 | — | — | |
| SCHEMBL15429245 | 0.85 | — | — | |
| SCHEMBL17250795 | 0.82 | — | — | |
| SCHEMBL19499984 | 0.82 | — | — | |
| SCHEMBL18767117 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230287018-A1 | PROCESS FOR PREPARING SILOXANES | WACKER CHEMIE AG (DE) | 2023-09-14 | — | — | US | disclosed |
| EP-4168416-A1 | PROCESS FOR PREPARING SILOXANES | Wacker Chemie AG (DE) | 2023-04-26 | — | — | EP | disclosed |
| CN-115916793-A | Process for preparing siloxanes | 瓦克化学股份公司 | 2023-04-04 | — | — | CN | disclosed |
| US-9543159-B2 | Patterning process of a semiconductor structure with a wet strippable middle layer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-01-10 | — | — | US | disclosed |
| US-9493676-B2 | Formulation composition for fluorinated organosiloxane network | XEROX CORPORATION (US) | 2016-11-15 | — | — | US | disclosed |
| US-9493676-B2 | Formulation composition for fluorinated organosiloxane network | XEROX CORPORATION (US) | 2016-11-15 | — | — | US | disclosed |
| US-20160284557-A1 | Patterning Process of a Semiconductor Structure with a Wet Strippable Middle Layer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD (TW) | 2016-09-29 | — | — | US | disclosed |
| US-9096776-B2 | Silicone release coating composition of condensation reaction curing type | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-20140285570-A1 | FORMULATION COMPOSITION FOR FLUORINATED ORGANOSILOXANE NETWORK | XEROX CORPORATION (US) | 2014-09-25 | — | — | US | disclosed |
| US-20140285570-A1 | FORMULATION COMPOSITION FOR FLUORINATED ORGANOSILOXANE NETWORK | XEROX CORPORATION (US) | 2014-09-25 | — | — | US | disclosed |
| US-8692011-B2 | Coatings for ink jet print head face | XEROX CORPORATION (US) | 2014-04-08 | — | — | US | disclosed |
| US-20130096257-A1 | SILICONE RELEASE COATING COMPOSITION OF CONDENSATION REACTION CURING TYPE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20120242749-A1 | COATINGS FOR INK JET PRINT HEAD FACE | XEROX CORPORATION (US) | 2012-09-27 | — | — | US | disclosed |
| US-20120156481-A1 | FUSER MEMBER AND COMPOSITION | XEROX CORPORATION (US) | 2012-06-21 | — | — | US | disclosed |
| US-20100233482-A1 | Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | HAMADA YOSHITAKA | 2010-09-16 | — | — | US | disclosed |
| US-7754330-B2 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-7241823-B2 | Radiation curing silicone rubber composition, adhesive silicone elastomer film formed from same, semiconductor device using same, and method of producing semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-10 | — | — | US | disclosed |
| US-4309557-A | Process for the preparation of alkyl and aryl substituted oligosiloxanes suitable for use as diffusion pump oils | NUSIL RESEARCH (US) | 1982-01-05 | — | — | US | disclosed |