SCHEMBL2957249

SCHEMBL2957249

CCCCCCCCc1ccc(S(=O)(=O)OS(c2ccc(C)cc2)(c2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.53
LMNA P02545 3/20 0.50
HIF1A Q16665 2/20 0.50
HTT P42858 2/20 0.50
CYP2D6 P10635 1/20 0.50
CYP2C9 P11712 1/20 0.50
TSHR P16473 1/20 0.50
CYP2C19 P33261 1/20 0.50
KCNH2 Q12809 1/20 0.50
CNR2 P34972 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.46
AKT1 P31749 6/20 0.44
KDM4E B2RXH2 2/20 0.44
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA9 Q16790 1/20 0.44
MCHR1 Q99705 1/20 0.43
ESR1 P03372 2/20 0.42
ADRA2A P08913 2/20 0.42
ADORA3 P0DMS8 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2956228 1.00 CA2 (0.53) CA2LMNAHIF1AHTTCYP2D6
SCHEMBL2967122 0.95 CNR2 (0.52) CA2LMNAHIF1AHTTCYP2D6
SCHEMBL2966134 0.95 CNR2 (0.52) CA2LMNAHIF1AHTTCYP2D6
SCHEMBL2958943 0.94 CA2 (0.53) CA2LMNAHIF1AHTTCYP2D6
SCHEMBL2963871 0.89 CNR2 (0.57) CA2LMNAHIF1AHTTCYP2D6
SCHEMBL2965338 0.89 CA2 (0.53) CA2LMNAHIF1AKCNH2CNR2
SCHEMBL2955496 0.89 CA2 (0.53) CA2LMNAHIF1AKCNH2CNR2
SCHEMBL11589672 0.86 CA2 (0.64) CA2LMNAHIF1AHTTSMN1; SMN2
SCHEMBL2323376 0.86 CA2 (0.64) CA2LMNAHIF1AHTTSMN1; SMN2
SCHEMBL2956172 0.86 CA2 (0.50) CA2CNR2SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed