SCHEMBL29580458

SCHEMBL29580458

CCC1=CCC=CC1.[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898403 0.97
SCHEMBL3973741 0.79
SCHEMBL3227379 0.78
Hydrochloric Acid SCHEMBL11691339 0.77
SCHEMBL167474 0.74
SCHEMBL2202914 0.74
SCHEMBL2357992 0.73 HTR2A (0.35)
SCHEMBL4358588 0.72
SCHEMBL6443904 0.72
SCHEMBL1371480 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025078718-A1 SUBSTRATE PROCESSING APPARATUS AND HEATER ELEMENT ASSEMBLY PICOSUN OY (FI) 2025-04-17 WO disclosed
US-20250060671-A1 SUBSTRATE PROCESSING APPARATUS AND METHOD ASM IP HOLDING B.V. (NL) 2025-02-20 US disclosed
US-12169361-B2 Substrate processing apparatus and method ASM IP HOLDING B.V. (NL) 2024-12-17 US disclosed
US-20240274687-A1 CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-08-15 US disclosed
US-12002867-B2 Contact structure for semiconductor device TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2024-06-04 US disclosed
US-11976364-B2 Method for selectively manufacturing material layer and target pattern INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS (KR) 2024-05-07 US disclosed
US-20230068965-A1 CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-03-02 US disclosed
US-20220145466-A1 METHOD FOR SELECTIVELY MANUFACTURING MATERIAL LAYER AND TARGET PATTERN INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS (KR) 2022-05-12 US disclosed
WO-2022092888-A1 ALLOY THIN FILM AND MANUFACTURING METHOD THEREFOR 한양대학교 에리카산학협력단 2022-05-05 WO disclosed