Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.32 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6037289 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL31135089 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL10455993 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL6037400 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL9715882 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL389625 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL6037284 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL6064426 | 1.00 | TSHR (0.48) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL297100 | 0.98 | TSHR (0.44) | TSHRALDH1A1ABCC4MAPTLMNA | |
| SCHEMBL8610462 | 0.95 | TSHR (0.42) | TSHRALDH1A1ABCC4MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103774494-B | Release liner compositions, the method for basic material and production basis material, and the purposes of the surface conditioning agent of basic material and surface conditioning agent | 芬欧汇川集团公司 | 2016-06-29 | — | — | CN | claimed |
| EP-2300544-B1 | A RELEASE LINER COMPOSITION, A BASE MATERIAL AND A METHOD OF PRODUCING A BASE MATERIAL, AND A SURFACE TREATING AGENT FOR A BASE MATERIAL AND A USE OF A SURFACE TREATING AGENT | UPM KYMMENE CORP (FI) | 2016-02-10 | — | — | EP | claimed |
| EP-2574644-B1 | A RELEASE LINER COMPOSITION, A BASE MATERIAL AND A METHOD OF PRODUCING A BASE MATERIAL, AND A SURFACE TREATING AGENT FOR A BASE MATERIAL AND A USE OF A SURFACE TREATING AGENT | UPM KYMMENE CORP (FI) | 2016-02-10 | — | — | EP | claimed |
| CN-103774494-A | A release liner composition, a base material and a method of producing a base material, and a surface treating agent for a base material and use of a surface treating agent | UPM KYMMENE CORP | 2014-05-07 | — | — | CN | claimed |
| CN-102056994-B | Release liner composition, base material and method for producing base material, and surface treatment agent for base material and use of surface treatment agent | UPM KYMMENE CORP | 2013-12-18 | — | — | CN | claimed |
| EP-2574644-A1 | A release liner composition, a base material and a method of producing a base material, and a surface treating agent for a base material and a use of a surface treating agent | UPM-Kymmene Corporation (FI) | 2013-04-03 | — | — | EP | claimed |
| CN-102015837-B | Sulfur modified silanes for the elaboration of high refractive index materials | ESSILOR INT | 2012-12-05 | — | — | CN | claimed |
| EP-2276793-B1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | ESSILOR INT (FR) | 2012-08-01 | — | — | EP | claimed |
| EP-2287231-B1 | Ulltraviolet transmissive polyhedral silsesquioxane polymers | PANASONIC CORP (JP) | 2012-06-06 | — | — | EP | claimed |
| US-8063237-B2 | Sulfur modified silanes for the elaboration of high refractive index materials | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2011-11-22 | — | — | US | claimed |
| EP-2300544-A1 | A RELEASE LINER COMPOSITION, A BASE MATERIAL AND A METHOD OF PRODUCING A BASE MATERIAL, AND A SURFACE TREATING AGENT FOR A BASE MATERIAL AND A USE OF A SURFACE TREATING AGENT | UPM-Kymmene Corporation (FI) | 2011-03-30 | — | — | EP | claimed |
| EP-2287231-A2 | Ulltraviolet transmissive polyhedral silesquioxane polymers | Panasonic Electric Works Co., Ltd. (JP) | 2011-02-23 | — | — | EP | claimed |
| EP-2276793-A1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | Essilor International (Compagnie Générale d'Optique) (FR) | 2011-01-26 | — | — | EP | claimed |
| WO-2009147283-A1 | A RELEASE LINER COMPOSITION, A BASE MATERIAL AND A METHOD OF PRODUCING A BASE MATERIAL, AND A SURFACE TREATING AGENT FOR A BASE MATERIAL AND A USE OF A SURFACE TREATING AGENT | UPM-KYMMENE CORPORATION (FI) | 2009-12-10 | — | — | WO | claimed |
| WO-2009138853-A1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | ESSILOR INTERNATIONAL (FR) | 2009-11-19 | — | — | WO | claimed |
| JP-2008523165-A | — | — | 2008-07-03 | — | — | JP | claimed |
| CN-101098911-A | Ultraviolet transmissive polyhedral silsequioxane polymers | MATSUSHITA ELECTRIC WORKS LTD (JP) | 2008-01-02 | — | — | CN | claimed |
| EP-1833880-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | Matsushita Electric Works, Ltd. (JP) | 2007-09-19 | — | — | EP | claimed |
| WO-2006062219-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2006-06-15 | — | — | WO | claimed |
| US-20060122351-A1 | Ultraviolet transmissive polyhedral silsesquioxane polymers | PANASONIC ELECTRIC WORKS CO., LTD. (JP) | 2006-06-08 | — | — | US | claimed |