SCHEMBL2959908

SCHEMBL2959908

CO[Si](C)(OC)OCOC(C)=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 1/20 0.32
CHRM5 P08912 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
PGR P06401 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
HTR1A P08908 1/20 0.32
CHRNB2 P17787 1/20 0.32
TBXA2R P21731 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
CHRNA10 Q9GZZ6 1/20 0.32
CHRNA9 Q9UGM1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27707261 0.82 ALDH1A1 (0.39) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL27898264 0.80 ALDH1A1 (0.45) ALDH1A1LMNAHSD17B10TDP1CHRM5
SCHEMBL1232370 0.79 TSHR (0.42) ALDH1A1TDP1TSHR
SCHEMBL27986758 0.77 ALDH1A1 (0.43) ALDH1A1LMNATSHR
SCHEMBL25906826 0.74
SCHEMBL7553249 0.74 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL15453440 0.74 ALDH1A1 (0.37) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL27811417 0.74 TSHR (0.41) ALDH1A1HSD17B10SMN1; SMN2TSHR
SCHEMBL28770370 0.74 GSTP1 (0.33) LMNA
SCHEMBL3115380 0.71 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105527802-A Photoresist cleaning fluid ANJI MICROELECTRONICS TECHNOLOGY(SHANGHAI) CO LTD 2016-04-27 CN claimed
CN-104570628-A Low-metal-etching photoresist stripping liquid and application thereof ANJI MICROELECTRONICS TECHNOLOGY SHANGHAI CO LTD 2015-04-29 CN claimed
US-6806311-B1 POLYDIMETHYLSILOXANE LUBRICANT AND REACTIVE SILANE SURFACE HYDROPHOBICIZING COMPONENT ABB RESEARCH LTD (CH) 2004-10-19 US claimed
CN-107209303-A Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2017-09-26 CN disclosed
CN-107075304-A High gain durable anti-reflective coating 恩基科技股份有限公司 2017-08-18 CN disclosed
CN-107077072-A It is capable of the resist lower membrane formation composition containing silicon of wet type removing 日产化学工业株式会社 2017-08-18 CN disclosed
CN-106661272-A Hybrid materials for use as coating agents in optoelectronic components AZ电子材料(卢森堡)责任有限公司 2017-05-10 CN disclosed
CN-103503081-B Electroconductive member, its manufacture method, touch screen and solar cell 富士胶片株式会社 2016-11-23 CN disclosed
CN-103403112-B Composition for forming low refractive index film, method for forming low refractive index film, low refractive index film formed by the method, and antireflection film 默克专利有限公司 2016-06-22 CN disclosed
CN-105527802-A Photoresist cleaning fluid ANJI MICROELECTRONICS TECHNOLOGY(SHANGHAI) CO LTD 2016-04-27 CN disclosed
CN-101689412-B Insulating film material, multi-layer wire substrate and manufacture method thereof and semiconductor device and manufacture method thereof FUJITSU LTD. (JP) 2015-10-14 CN disclosed
CN-101689412-A Insulating film material, multilayer wiring board and process for producing the multilayer wiring board, and semiconductor apparatus and process for producing the semiconductor device FUJITSU LTD 2010-03-31 CN disclosed
CN-101563301-A Articles having water-repellent surfaces ASAHI GLASS CO LTD (JP) 2009-10-21 CN disclosed
CN-101535374-A Curable organic polymer, process for producing the same, and curable composition containing the same KANEKA CORP (JP) 2009-09-16 CN disclosed
CN-101389715-A Systems and methods for functionalizing particulates with silane-containing materials DOW CORNING (US) 2009-03-18 CN disclosed
US-20080210948-A1 High-Heat-Resistive Semiconductor Device THE KANSAI ELECTRIC POWER CO., INC. (JP) 2008-09-04 US disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed
CN-101032023-A Semiconductor device KANSAI ELECTRIC POWER CO (JP) 2007-09-05 CN disclosed
EP-1801871-A1 SEMICONDUCTOR DEVICE THE KANSAI ELECTRIC POWER CO., INC. (JP) 2007-06-27 EP disclosed
CN-1930245-A Silicon-containing curable composition and cured object obtained by thermally curing the same ADEKA CORP (JP) 2007-03-14 CN disclosed