SCHEMBL2960936

SCHEMBL2960936

O=C(O)c1ncccc1Cc1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.64
MAPT P10636 2/20 0.64
CYP1A2 P05177 1/20 0.64
ALDH1A1 P00352 3/20 0.52
TSHR P16473 2/20 0.52
CYP3A4 P08684 1/20 0.52
ALOX15 P16050 1/20 0.52
BLM P54132 1/20 0.52
AGER Q15109 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
PAX8 Q06710 1/20 0.47
ASPH Q12797 2/20 0.45
KDM8 Q8N371 2/20 0.45
MET P08581 1/20 0.45
CYP2C9 P11712 1/20 0.44
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
GAA P10253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8126278 0.98 KDM4E (0.62) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL27435770 0.90 KDM4E (0.60) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL163384 0.89 KDM4E (0.50) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL27231741 0.89 KDM4E (0.72) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL27410791 0.87 KDM4E (0.57) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL30006999 0.86 KDM4E (0.47) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL28492022 0.86 KDM4E (0.47) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL1551666 0.85 KDM4E (0.46) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL10749832 0.84 KDM4E (0.62) KDM4EMAPTCYP1A2ALDH1A1TSHR
SCHEMBL27435766 0.83 KDM4E (0.60) KDM4EMAPTCYP1A2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101624714-B Cu-Sn-Zn plating solution containing organic addition agent and electroplating technique utilizing same QIANG DU 2010-12-29 CN claimed
CN-101624714-A Cu-Sn-Zn plating solution containing organic addition agent and electroplating technique utilizing same QIANG DU 2010-01-13 CN claimed
EP-0377357-B1 Process for the condensation of at least one epoxide on at least one cyclic anhyhride in the presence of a titanium-based catalyst INST FRANCAIS DU PETROLE (FR) 1994-03-23 EP claimed
US-4997910-A Polyesters INSTITUT FRANCAIS DU PETROLE (FR) 1991-03-05 US claimed
EP-0193848-B1 GALVANIC BATH FOR THE ELECTRODEPOSITION OF GOLD ALLOYS Emmenegger, Heinz (CH) 1989-08-16 EP claimed
US-4687557-A MIXTURE OF CYANIDE COMPLEXES OF GOLD, COPPER, CADMIUM, AND ZINC EMMENEGGER HEINZ (CH) 1987-08-18 US claimed
EP-0143919-B1 ALKALINE CYANIDE BATH FOR THE ELECTRODEPOSITION OF COPPER-TIN-ALLOY LAYERS Degussa Aktiengesellschaft (DE) 1987-07-29 EP claimed
EP-0193848-A1 Galvanic bath for the electrodeposition of gold alloys Emmenegger, Heinz (CH) 1986-09-10 EP claimed
US-4565608-A Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings DEGUSSA AKTIENGESELLSCHAFT (DE) 1986-01-21 US claimed
EP-0143919-A1 Alkaline cyanide bath for the electrodeposition of copper-tin-alloy layers Degussa Aktiengesellschaft (DE) 1985-06-12 EP claimed
CN-110291229-B Aqueous alkaline electrolyte for depositing a zinc-containing layer on the surface of a metal blank 科德宝两合公司 2022-04-29 CN disclosed
CN-110846693-B High-dispersity alkaline cyanide-free zinc plating brightener and preparation method and application thereof 武汉奥邦表面技术有限公司 2020-11-10 CN disclosed
CN-110846693-A High-dispersity alkaline cyanide-free zinc plating brightener and preparation method and application thereof 武汉奥邦表面技术有限公司 2020-02-28 CN disclosed
CN-104195593-A An additive for zinc electrodeposition in an ammoniacal system and a preparing method thereof WANG RUIXIANG 2014-12-10 CN disclosed
CN-101624714-B Cu-Sn-Zn plating solution containing organic addition agent and electroplating technique utilizing same QIANG DU 2010-12-29 CN disclosed
EP-0143919-B1 ALKALINE CYANIDE BATH FOR THE ELECTRODEPOSITION OF COPPER-TIN-ALLOY LAYERS Degussa Aktiengesellschaft (DE) 1987-07-29 EP disclosed
EP-0193848-A1 Galvanic bath for the electrodeposition of gold alloys Emmenegger, Heinz (CH) 1986-09-10 EP disclosed
US-4605474-A Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings HOFFACKER GERD (DE) 1986-08-12 US disclosed
US-4565608-A Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings DEGUSSA AKTIENGESELLSCHAFT (DE) 1986-01-21 US disclosed
EP-0143919-A1 Alkaline cyanide bath for the electrodeposition of copper-tin-alloy layers Degussa Aktiengesellschaft (DE) 1985-06-12 EP disclosed