Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | SLC22A12 | Q96S37 | 9/20 | 0.50 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.44 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.44 |
| ▸ | SLC22A8 | Q8TCC7 | 2/20 | 0.44 |
| ▸ | SLC22A11 | Q9NSA0 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | MMP7 | P09237 | 1/20 | 0.43 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL247640 | 1.00 | KMT2A (0.56) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| SCHEMBL6114993 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| SCHEMBL28361718 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| SCHEMBL3783669 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL5470277 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| SCHEMBL16340978 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL4303729 | 0.98 | KMT2A (0.55) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| Ethylene SCHEMBL28389877 | 0.96 | KMT2A (0.53) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| Anthraquinone SCHEMBL28562418 | 0.91 | KMT2A (0.53) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 | |
| Biphenyl SCHEMBL6253032 | 0.91 | KMT2A (0.49) | KMT2AMEN1SLC22A12HSD11B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | claimed |
| WO-2023028249-A9 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-10-12 | — | — | WO | claimed |
| WO-2023076224-A9 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-06-15 | — | — | WO | claimed |
| WO-2023076251-A1 | MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION | GEMINATIO INC. (US) | 2023-05-04 | — | — | WO | claimed |
| WO-2023076224-A1 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-05-04 | — | — | WO | claimed |
| WO-2023028223-A1 | OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028243-A1 | NARROW LINE CUT MASKING PROCESS | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028246-A1 | ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028236-A1 | IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028244-A1 | GENERATION OF MULTILINE ETCH SUBSTRATES | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028245-A1 | SELF-ALIGNED BUILD-UP PROCESSING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028259-A1 | ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028249-A1 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| US-20260079397-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT | TORAY INDUSTRIES, INC. (JP) | 2026-03-19 | — | — | US | disclosed |
| EP-4597224-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT | Toray Industries, Inc. (JP) | 2025-08-06 | — | — | EP | disclosed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | disclosed |
| WO-2023028223-A1 | OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028249-A1 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028245-A1 | SELF-ALIGNED BUILD-UP PROCESSING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| CN-111699206-B | Polymers comprising photoacid generators | 株式会社LG化学 | 2022-05-10 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079397-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT | PPA1, PHOSPHO1, PHPT1 | KMT2A 1262/4885MEN1 3852/4885SLC22A12 4207/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.