SCHEMBL247640

SCHEMBL247640

O=S(=O)(O)c1ccccc1C(F)(F)F

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.56
MEN1 O00255 2/20 0.56
SLC22A12 Q96S37 9/20 0.50
HSD11B1 P28845 2/20 0.50
ALDH1A1 P00352 1/20 0.49
KAT6A Q92794 1/20 0.46
RAB9A P51151 1/20 0.44
CYP2C9 P11712 2/20 0.44
SLC22A6 Q4U2R8 2/20 0.44
SLC22A8 Q8TCC7 2/20 0.44
SLC22A11 Q9NSA0 2/20 0.44
GAA P10253 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
MMP7 P09237 1/20 0.43
RXFP1 Q9HBX9 1/20 0.43
CYP3A4 P08684 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29624178 1.00 KMT2A (0.56) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
SCHEMBL6114993 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
SCHEMBL28361718 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
SCHEMBL3783669 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
Ammonia Solution, Strong SCHEMBL5470277 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
SCHEMBL16340978 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
Hydrochloric Acid SCHEMBL4303729 0.98 KMT2A (0.55) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
Ethylene SCHEMBL28389877 0.96 KMT2A (0.53) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
Anthraquinone SCHEMBL28562418 0.91 KMT2A (0.53) KMT2AMEN1SLC22A12HSD11B1ALDH1A1
Biphenyl SCHEMBL6253032 0.91 KMT2A (0.49) KMT2AMEN1SLC22A12HSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1099 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260079397-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT TORAY INDUSTRIES, INC. (JP) 2026-03-19 US claimed
US-12547072-B2 Self-aligned build-up processing GEMINATIO, INC. (US) 2026-02-10 US claimed
EP-4597224-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT Toray Industries, Inc. (JP) 2025-08-06 EP claimed
US-20250244664-A1 PHOTORESIST COMPOSITIONS AND PATTERNING METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2025-07-31 US claimed
US-20250233019-A1 MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION GEMINATIO, INC. (US) 2025-07-17 US claimed
US-20250216782-A1 MASKING PROCESS USING SWITCHABLE POLYMER TOKYO ELECTRON LTD (JP) 2025-07-03 US claimed
CN-119895333-A Photosensitive composition, cured product, electronic component, and method for producing cured product 东丽株式会社 2025-04-25 CN claimed
US-20250130501-A1 ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY GEMINATIO, INC. (US) 2025-04-24 US claimed
US-20250132207-A1 OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE GEMINATIO, INC. (US) 2025-04-24 US claimed
US-20250102910-A1 PHOTORESIST COMPOSITION AND METALLIZATION METHOD U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2025-03-27 US claimed
US-20030215748-A1 Mixtures of alkaline soluble terpolymers and acid generators used to form films for transfering images to substrates SHIPLEY COMPANY, L.L.C. (US) 2003-11-20 US claimed
US-6645698-B1 Photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon SHIPLEY COMPANY, L.L.C. 2003-11-11 US claimed
US-20020147331-A1 Methods for synthesis of oligonucleotides ISIS PHARMACEUTICALS, INC. 2002-10-10 US claimed
WO-2002062811-A2 IMPROVED METHODS FOR SYNTHESIS OF OLIGONUCLEOTIDES ISIS PHARMACEUTICALS, INC. (US) 2002-08-15 WO claimed
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US claimed
US-6037107-A EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS SHIPLEY COMPANY, L.L.C. (US) 2000-03-14 US claimed
EP-0569884-B1 Rust inhibitor UNION CHEMICAL CO LTD (JP) 1996-09-18 EP claimed
EP-0153692-B1 METHOD FOR ISOMERIZATION A GLYCIDATE DERIVATIVE SAGAMI CHEMICAL RESEARCH CENTER (JP) 1992-07-29 EP claimed
US-4621150-A METAL PERHALATE OR SULFONATE OR COMPLEX; GLYCIDATE, 2-HYDROXY-3-BUTENOATE, EPOXIDE SAGAMI CHEMICAL RESEARCH CENTER (JP) 1986-11-04 US claimed
EP-0153692-A2 Method for isomerization a glycidate derivative SAGAMI CHEMICAL RESEARCH CENTER (JP) 1985-09-04 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12547072-B2 Self-aligned build-up processing MYBBP1A, SMURF1, MYB KMT2A 1426/4885MEN1 1283/4885SLC22A12 4649/4885
US-20260079397-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING CURED PRODUCT PPA1, PHOSPHO1, PHPT1 KMT2A 1262/4885MEN1 3852/4885SLC22A12 4207/4885
US-20020147331-A1 Methods for synthesis of oligonucleotides RNGTT, TYMP, PNP KMT2A 3974/4885MEN1 2222/4885SLC22A12 3182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.