Ethyl Acetate

Ethyl Acetate

SCHEMBL2963031

CCOC(C)=O.CCOCC(C)O.COCCO

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.44
HSD17B10 Q99714 3/20 0.44
LMNA P02545 1/20 0.44
TSHR P16473 2/20 0.42
MAPT P10636 1/20 0.32
GALR3 O60755 2/20 0.31
THRB P10828 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CHRM5 P08912 2/20 0.31
CHRM1 P11229 2/20 0.31
CHRM3 P20309 2/20 0.31
PGR P06401 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
HTR1A P08908 1/20 0.31
CHRNB2 P17787 1/20 0.31
TBXA2R P21731 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethyl Acetate SCHEMBL152186 0.87 ALDH1A1 (0.58) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL28349798 0.85 ALDH1A1 (0.52) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL7090484 0.85 ALDH1A1 (0.52) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL1744775 0.83 ALDH1A1 (0.58) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL110240 0.83 ALDH1A1 (0.64) ALDH1A1HSD17B10LMNATSHRGALR3
SCHEMBL29256471 0.83 ALDH1A1 (0.47) ALDH1A1HSD17B10LMNATSHRMAPT
SCHEMBL28066913 0.83 ALDH1A1 (0.61) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL155543 0.82 ALDH1A1 (0.39) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL5073455 0.81 ALDH1A1 (0.56) ALDH1A1HSD17B10LMNATSHRMAPT
Ethyl Acetate SCHEMBL7849617 0.81 ALDH1A1 (0.61) ALDH1A1HSD17B10LMNATSHRGALR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8329376-B2 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-11 US disclosed
US-7855043-B2 Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-21 US disclosed
US-20080026322-A1 Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film SHIN-ETSU CHEMICAL CO., LTD. 2008-01-31 US disclosed
US-20070238300-A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method SHIN-ETSU CHEMICAL CO., LTD. 2007-10-11 US disclosed