Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.56 |
| ▸ | RAB9A | P51151 | 1/20 | 0.56 |
| ▸ | MAOB | P27338 | 6/20 | 0.52 |
| ▸ | HPGD | P15428 | 4/20 | 0.51 |
| ▸ | KLKB1 | P03952 | 1/20 | 0.50 |
| ▸ | PPARD | Q03181 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.49 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | RECQL | P46063 | 2/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | PGR | P06401 | 1/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.49 |
| ▸ | AR | P10275 | 1/20 | 0.49 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.49 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2484546 | 1.00 | NPC1 (0.56) | NPC1RAB9AMAOBHPGDKLKB1 | |
| SCHEMBL30084765 | 0.95 | NPC1 (0.61) | NPC1RAB9AMAOBHPGDPPARD | |
| SCHEMBL1116009 | 0.95 | NPC1 (0.61) | NPC1RAB9AMAOBHPGDPPARD | |
| SCHEMBL30084771 | 0.94 | NPC1 (0.56) | NPC1RAB9AMAOBHPGDKLKB1 | |
| SCHEMBL2488676 | 0.94 | NPC1 (0.56) | NPC1RAB9AMAOBHPGDKLKB1 | |
| SCHEMBL20496435 | 0.92 | NPC1 (0.57) | NPC1RAB9AMAOBHPGDPPARD | |
| SCHEMBL1116290 | 0.92 | NPC1 (0.65) | NPC1RAB9AMAOBHPGDKLKB1 | |
| SCHEMBL30084733 | 0.92 | NPC1 (0.65) | NPC1RAB9AMAOBHPGDKLKB1 | |
| SCHEMBL29415005 | 0.91 | HPGD (0.62) | MAOBHPGDPPARDKDM4EALOX15 | |
| SCHEMBL20496479 | 0.91 | HPGD (0.62) | MAOBHPGDPPARDKDM4EALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4605460-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | Cytec Industries Inc. (US) | 2025-08-27 | — | — | EP | claimed |
| WO-2025099141-A1 | STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | claimed |
| WO-2025099143-A1 | COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | claimed |
| WO-2025056330-A1 | STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE | CYTEC INDUSTRIES INC. (US) | 2025-03-20 | — | — | WO | claimed |
| EP-4363506-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | Cytec Industries Inc. (US) | 2024-05-08 | — | — | EP | claimed |
| WO-2024083872-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2024-04-25 | — | — | WO | claimed |
| EP-4251689-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | Cytec Industries, Inc. (US) | 2023-10-04 | — | — | EP | claimed |
| WO-2023278282-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2023-01-05 | — | — | WO | claimed |
| WO-2022115578-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | claimed |
| WO-2022115573-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | claimed |
| EP-4605460-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | Cytec Industries Inc. (US) | 2025-08-27 | — | — | EP | disclosed |
| WO-2025099143-A1 | COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | disclosed |
| WO-2025099141-A1 | STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | disclosed |
| WO-2025056330-A1 | STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE | CYTEC INDUSTRIES INC. (US) | 2025-03-20 | — | — | WO | disclosed |
| EP-4457069-A1 | POLYMER COMPOSITIONS HAVING DENSIFICATION ACCELERATORS AND ROTATIONAL MOLDING PROCESSES FOR MAKING HOLLOW ARTICLES THEREFROM | Cytec Industries Inc. (US) | 2024-11-06 | — | — | EP | disclosed |
| CN-112055728-B | Granular stabilizer composition for polymer resin and method for producing the same | 塞特工业公司 | 2023-05-05 | — | — | CN | disclosed |
| WO-2023278282-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2023-01-05 | — | — | WO | disclosed |
| CN-115368629-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2022-11-22 | — | — | CN | disclosed |
| WO-2022115578-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | disclosed |
| WO-2022115573-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | disclosed |