Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 5/20 | 0.52 |
| ▸ | DRD3 | P35462 | 2/20 | 0.52 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.48 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.47 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.47 |
| ▸ | BAD | Q92934 | 1/20 | 0.47 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.46 |
| ▸ | HTR1A | P08908 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7728944 | 1.00 | DRD2 (0.52) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL10454756 | 1.00 | DRD2 (0.52) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL11514328 | 1.00 | DRD2 (0.52) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL11514315 | 1.00 | DRD2 (0.52) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL10454755 | 1.00 | DRD2 (0.52) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL4820418 | 0.84 | DRD2 (0.54) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL4826397 | 0.84 | DRD2 (0.54) | DRD2DRD3SLC18A3CYP19A1CHRM3 | |
| SCHEMBL11353321 | 0.80 | CHRM3 (0.54) | DRD2DRD3CHRM3 | |
| SCHEMBL11353331 | 0.80 | CHRM3 (0.54) | DRD2DRD3CHRM3 | |
| SCHEMBL11827052 | 0.80 | CHRM3 (0.43) | DRD2DRD3CHRM3CHRM2CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116097398-A | Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same | 荣昌化学制品株式会社 | 2023-05-09 | — | — | CN | claimed |
| CN-114450640-A | Process liquid composition for lithography and pattern formation method using the same | 荣昌化学制品株式会社 | 2022-05-06 | — | — | CN | claimed |
| CN-120019333-A | Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same | YC化学制品株式会社 | 2025-05-16 | — | — | CN | disclosed |
| WO-2024106711-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | 와이씨켐 주식회사 | 2024-05-23 | — | — | WO | disclosed |
| CN-117586598-A | Crosslinkable polymer composition and use thereof | 科腾聚合物荷兰有限责任公司 | 2024-02-23 | — | — | CN | disclosed |
| EP-4212958-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2023-07-19 | — | — | EP | disclosed |
| CN-116097398-A | Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same | 荣昌化学制品株式会社 | 2023-05-09 | — | — | CN | disclosed |
| CN-114450640-A | Process liquid composition for lithography and pattern formation method using the same | 荣昌化学制品株式会社 | 2022-05-06 | — | — | CN | disclosed |