Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.48 |
| ▸ | STAT3 | P40763 | 1/20 | 0.47 |
| ▸ | ABCG2 | Q9UNQ0 | 3/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.46 |
| ▸ | APP | P05067 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.42 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.42 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.42 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.42 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.42 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.42 |
| ▸ | MIF | P14174 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3843648 | 0.91 | MEN1 (0.43) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL4598237 | 0.88 | PSEN1 (0.49) | MEN1KMT2ANPC1RAB9AMAPT | |
| 4-Vinylphenol SCHEMBL3332947 | 0.86 | MEN1 (0.47) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL7270963 | 0.86 | MEN1 (0.40) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL8045161 | 0.85 | MEN1 (0.39) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL6551628 | 0.85 | MEN1 (0.39) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL8050238 | 0.83 | MEN1 (0.38) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL6551223 | 0.82 | ABCG2 (0.38) | MEN1KMT2ANPC1RAB9APTGS2 | |
| SCHEMBL7768560 | 0.81 | PTPN1 (0.55) | MEN1KMT2ANPC1RAB9AMAPT | |
| SCHEMBL1045679 | 0.81 | ELANE (0.54) | MEN1KMT2AMAPTPSEN1PSEN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-6605409-B2 | Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20020006578-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| US-6060213-A | FOR USE IN THE PROCESS FOR THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATES AND SEMICONDUCTORS SUCH AS INTEGRATED CIRCUITS OR CIRCUIT BOARDS FOR LIQUID CRYSTAL, THERMAL HEAD, ETC. OR OTHER PHOTOFABRICATION PROCESSES | FUJI PHOTO FILM CO., LTD. (KR) | 2000-05-09 | — | — | US | disclosed |
| EP-0595361-B1 | Method of forming micropatterns with heat resistance | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0883163-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) | 1998-12-09 | — | — | EP | disclosed |
| US-5741628-A | CHEMICAL AMPLIFICATION WHICH GENERATES AN ACID IN RESPONSE TO LASER RADIATION | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-04-21 | — | — | US | disclosed |
| US-5679500-A | FORMING RESIST FILM BY USING A CHEMICAL AMPLIFICATION RESIST WHICH GENERATES AN ACID IN RESPONSE TO LASER LIGHT AND WHICH REACTS WITH THE ACID | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5658711-A | FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| EP-0691674-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-10 | — | — | EP | disclosed |
| EP-0595361-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |