Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18561744 | 0.78 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL1128525 | 0.78 | CA1 (0.36) | CA1CA2CA9 | |
| SCHEMBL6366778 | 0.73 | CA1 (0.39) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL18785569 | 0.70 | CA1 (0.37) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL12039690 | 0.70 | CA1 (0.41) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL13345049 | 0.70 | CA1 (0.37) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL18785575 | 0.70 | CA1 (0.37) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL9244581 | 0.68 | CA1 (0.32) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL385055 | 0.68 | TSHR (0.36) | CA1CA2CA9ALDH1A1L3MBTL1 | |
| SCHEMBL14527512 | 0.68 | CA1 (0.40) | CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9140981-B2 | Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | FUJIFILM CORPORATION (JP) | 2015-09-22 | — | — | US | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |