Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 5/20 | 0.46 |
| ▸ | GABRB2 | P47870 | 4/20 | 0.46 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.43 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | FAAH | O00519 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.42 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.42 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.42 |
| ▸ | HTR2B | P41595 | 1/20 | 0.42 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL545484 | 1.00 | GABRA1 (0.46) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| Hydrogen Peroxide SCHEMBL18037718 | 0.95 | GABRA1 (0.48) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| SCHEMBL11654644 | 0.90 | GABRA1 (0.46) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| Isopropylbenzene SCHEMBL7651424 | 0.89 | HTT (0.44) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| SCHEMBL28857407 | 0.89 | GABRA1 (0.39) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| SCHEMBL6546540 | 0.85 | GABRA1 (0.42) | GABRA1GABRB2SLC6A2TSHRCYP3A4 | |
| SCHEMBL395017 | 0.83 | GABRA1 (0.44) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| SCHEMBL10721566 | 0.83 | GABRA1 (0.46) | GABRA1GABRB2SLC6A2TSHRLMNA | |
| SCHEMBL14650862 | 0.83 | GABRA1 (0.41) | GABRA1GABRB2GABRG2GABRB3SLC6A2 | |
| SCHEMBL10319639 | 0.83 | GABRA1 (0.44) | GABRA1GABRB2GABRG2GABRB3SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026047396-A1 | SYSTEM AND METHOD FOR CONVERTING WASTE POLYOLEFINS, RENEWABLE OILS, AND PARAFFINIC CRUDES TO AROMATIC COMPOUNDS | Aduro Clean Technologies, Inc. (CA) | 2026-03-05 | — | — | WO | disclosed |
| US-20250368900-A1 | System and Method for Converting Waste Polyolefins, Renewable Oils, and Paraffinic Crudes to Aromatic Compounds | ADURO CLEAN TECH INC (CA) | 2025-12-04 | — | — | US | disclosed |
| CN-120192340-A | Metal-containing film forming compound, metal-containing film forming composition, and pattern forming method | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-120192535-A | Metal-containing film forming compound, metal-containing film forming composition, and pattern forming method | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-117024997-B | Composition for forming metal oxide film, pattern forming method, and metal oxide film forming method | 信越化学工业株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-116694114-B | Composition for forming metal oxide film, pattern forming method, and metal oxide film forming method | 信越化学工业株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-115586699-B | Adhesive film forming material, adhesive film forming method using same, and pattern forming method using adhesive film forming material | 信越化学工业株式会社 | 2025-05-20 | — | — | CN | disclosed |
| CN-119861529-A | Composition for forming resist underlayer film, method for producing resist underlayer film, pattern forming method, and method for producing semiconductor device | 信越化学工业株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119846902-A | Composition for forming resist underlayer film, method for producing resist underlayer film, pattern forming method, and method for producing semiconductor device | 信越化学工业株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119698325-A | Microcapsule and encapsulation thereof | 丝趣科尔卡有限公司 | 2025-03-25 | — | — | CN | disclosed |
| CN-116107167-A | Resist underlayer film material, pattern forming method, and resist underlayer film forming method | 信越化学工业株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-116110781-A | Filling film forming material for suppressing collapse of semiconductor substrate pattern and method for treating semiconductor substrate | 信越化学工业株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-115963695-A | Organic film forming material, pattern forming method, and compound | 信越化学工业株式会社 | 2023-04-14 | — | — | CN | disclosed |
| CN-115925503-A | Method for producing substituted aromatic hydrocarbon by gas-phase alkylation and catalyst thereof | 中国石油化工股份有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-115877657-A | Composition for forming organic film, method for forming pattern, compound for forming organic film, and polymer | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-115845913-A | Method for producing substituted aromatic hydrocarbon by alkylation, catalyst and preparation method thereof | 中国石油化工股份有限公司 | 2023-03-28 | — | — | CN | disclosed |
| CN-115586699-A | Adhesive film forming material, method for forming adhesive film using same, and method for forming pattern using adhesive film forming material | 信越化学工业株式会社 | 2023-01-10 | — | — | CN | disclosed |
| CN-111218023-B | Conductive thermal expansion microsphere with good flame retardance and preparation method thereof | 快思瑞科技(上海)有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-114675490-A | Organic film forming material, pattern forming method, compound and polymer | 信越化学工业株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-114545733-A | Resist underlayer film material, pattern formation method, and resist underlayer film formation method | 信越化学工业株式会社 | 2022-05-27 | — | — | CN | disclosed |