SCHEMBL29658106

SCHEMBL29658106

O=C(O)c1cccc(Oc2ccc(Oc3ccc(Oc4cccc(C(=O)O)c4C(=O)O)cc3)cc2)c1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTNNB1 P35222 1/20 0.49
POLB P06746 4/20 0.47
KMT2A Q03164 3/20 0.47
MEN1 O00255 2/20 0.47
MITF O75030 1/20 0.47
LMNA P02545 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALDH1A1 P00352 6/20 0.46
GAA P10253 1/20 0.46
CRHBP P24387 1/20 0.46
FNTA P49354 1/20 0.46
FNTB P49356 1/20 0.46
CRHR2 Q13324 1/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
KDM4E B2RXH2 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL425841 1.00 CTNNB1 (0.49) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL31105217 0.98 CTNNB1 (0.50) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL261107 0.98 CTNNB1 (0.50) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL4100316 0.93 CTNNB1 (0.46) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL29435067 0.93 CTNNB1 (0.58) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL34487 0.93 CTNNB1 (0.58) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL28325149 0.91 SRD5A2 (0.50) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL422032 0.91 POLB (0.57) POLBKMT2AMEN1MITFLMNA
SCHEMBL425732 0.90 SRD5A2 (0.53) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL11066360 0.89 CTNNB1 (0.54) CTNNB1POLBKMT2AMEN1MITF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119497906-A Method for producing substrate laminate and substrate laminate 三井化学株式会社 2025-02-21 CN disclosed
CN-115956098-B Composition, laminate, and method for producing laminate 三井化学株式会社 2024-11-26 CN disclosed
CN-117941037-A Composition for forming film for semiconductor, laminate, and substrate laminate 三井化学株式会社 2024-04-26 CN disclosed
CN-110545997-B Substrate laminate and method for manufacturing substrate laminate 三井化学株式会社 2022-05-24 CN disclosed