SCHEMBL4100316

SCHEMBL4100316

O=C(O)c1cccc(Oc2ccc(-c3ccc(Oc4cccc(C(=O)O)c4C(=O)O)cc3)cc2)c1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTNNB1 P35222 1/20 0.46
POLB P06746 3/20 0.45
KMT2A Q03164 3/20 0.45
MEN1 O00255 2/20 0.45
MITF O75030 1/20 0.45
LMNA P02545 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 4/20 0.44
GAA P10253 1/20 0.44
CRHBP P24387 1/20 0.44
FNTA P49354 1/20 0.44
FNTB P49356 1/20 0.44
CRHR2 Q13324 1/20 0.44
DHODH Q02127 3/20 0.43
CDC25B P30305 1/20 0.43
ATM Q13315 1/20 0.43
KDM4E B2RXH2 2/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfur Dioxide SCHEMBL19640822 0.95 CTNNB1 (0.42) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL31105217 0.95 CTNNB1 (0.50) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL261107 0.95 CTNNB1 (0.50) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL29658106 0.93 CTNNB1 (0.49) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL425841 0.93 CTNNB1 (0.49) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL19640372 0.92 CTNNB1 (0.41) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL22310927 0.90 POLB (0.39) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL3417323 0.90 TDP1 (0.54) POLBKMT2AMEN1MITFLMNA
SCHEMBL34487 0.89 CTNNB1 (0.58) CTNNB1POLBKMT2AMEN1MITF
SCHEMBL29435067 0.89 CTNNB1 (0.58) CTNNB1POLBKMT2AMEN1MITF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1318174-B1 Method of manufacture of polyester molding compositions and articles produced therefrom GEN ELECTRIC (US) 2007-03-07 EP claimed
US-20030125478-A1 HIGH PERFORMANCE THERMOPLASTIC COMPOSITIONS WITH IMPROVED MELT FLOW PROPERTIES SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2003-07-03 US claimed
CN-119654696-A Method for manufacturing substrate laminate and semiconductor device 三井化学株式会社 2025-03-18 CN disclosed
CN-115956098-B Composition, laminate, and method for producing laminate 三井化学株式会社 2024-11-26 CN disclosed
CN-117941037-A Composition for forming film for semiconductor, laminate, and substrate laminate 三井化学株式会社 2024-04-26 CN disclosed
CN-117897799-A Composition for forming film for semiconductor, laminate, and substrate laminate 三井化学株式会社 2024-04-16 CN disclosed
CN-117070147-A Composition for producing film for semiconductor device and method for producing same 三井化学株式会社 2023-11-17 CN disclosed
CN-108352320-B Film composition for semiconductor, method for producing same, and semiconductor device 三井化学株式会社 2023-09-08 CN disclosed
CN-115956098-A Composition, laminate, and method for producing laminate 三井化学株式会社 2023-04-11 CN disclosed
US-20220162386-A1 METHOD OF MAKING A BIPHENOL DIANHYDRIDE COMPOSITION, METHOD FOR PURIFICATION OF A BIPHENOL DIANHYDRIDE COMPOSITION, AND POLY(ETHERIMIDES) DERIVED FROM THE BIPHENOL DIANHYDRIDE SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2022-05-26 US disclosed
CN-110545997-B Substrate laminate and method for manufacturing substrate laminate 三井化学株式会社 2022-05-24 CN disclosed
US-5081298-A Bis(pentaalkylguanidinium) alkane salts as phase transfer catalysts GENERAL ELECTRIC COMPANY (US) 1992-01-14 US disclosed
US-4975470-A TOUGHNESS, HEAT RESISTANCE, STRESS RESISTANCE, NONCRACKING AMOCO CORPORATION (US) 1990-12-04 US disclosed
US-4965337-A MOLDING MATERIALS; REPLACEMENT FOR METAL GENERAL ELECTRIC COMPANY (US) 1990-10-23 US disclosed
EP-0330739-A2 Very high heat resistant thermoplastic polyether imides containing an aromatic structure GENERAL ELECTRIC COMPANY (US) 1989-09-06 EP disclosed
EP-0331493-A2 Medical devices made from poly(etherimides) AMOCO CORPORATION (US) 1989-09-06 EP disclosed
US-4837299-A FROM AROMATIC DIANHYDRIDE AND ORGANIC DIAMINE IN PRESENCE OF TERTIARY AMINE; IMIDIZATION GENERAL ELECTRIC COMPANY (US) 1989-06-06 US disclosed
US-4835249-A Process for preparing polyimides GENERAL ELECTRIC COMPANY (US) 1989-05-30 US disclosed
WO-1985001509-A1 BLENDS OF A POLY(ARYL KETONE) AND A POLYETHERIMIDE UNION CARBIDE CORPORATION (US) 1985-04-11 WO disclosed
US-3991004-A Method for making polyetherimide GENERAL ELECTRIC COMPANY (US) 1976-11-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220162386-A1 METHOD OF MAKING A BIPHENOL DIANHYDRIDE COMPOSITION, METHOD FOR PURIFICATION OF A BIPHENOL DIANHYDRIDE COMPOSITION, AND POLY(ETHERIMIDES) DERIVED FROM THE BIPHENOL DIANHYDRIDE CA3, FHIT, PPIP5K2 CTNNB1 2002/4885POLB 2557/4885KMT2A 1924/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.