⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12796084 | 0.79 | — | — | |
| SCHEMBL30783362 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL31578484 | 0.74 | TSHR (0.32) | — | |
| SCHEMBL9346745 | 0.71 | — | — | |
| SCHEMBL7863401 | 0.71 | ALDH1A1 (0.35) | — | |
| SCHEMBL8762253 | 0.70 | TSHR (0.31) | — | |
| SCHEMBL30283423 | 0.70 | TSHR (0.36) | — | |
| SCHEMBL12796100 | 0.69 | — | — | |
| SCHEMBL12796087 | 0.69 | — | — | |
| SCHEMBL12902855 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118894962-B | Aging-resistant holographic polymer dispersed liquid crystal material, grating device and preparation method thereof | 尼卡光学(天津)有限公司 | 2025-01-21 | — | — | CN | claimed |
| CN-118894969-B | Holographic polymer dispersed liquid crystal material with thermal aging resistance, grating device and preparation method of holographic polymer dispersed liquid crystal material | 尼卡光学(天津)有限公司 | 2025-01-03 | — | — | CN | claimed |
| CN-119119374-A | UV-cured high-temperature-resistant resin for thermal runaway protection material and application | 武汉长盈鑫科技有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118894962-A | Aging-resistant holographic polymer dispersed liquid crystal material, grating device and preparation method thereof | 尼卡光学(天津)有限公司 | 2024-11-05 | — | — | CN | claimed |
| CN-118894969-A | Holographic polymer dispersed liquid crystal material with thermal aging resistance, grating device and preparation method of holographic polymer dispersed liquid crystal material | 尼卡光学(天津)有限公司 | 2024-11-05 | — | — | CN | claimed |
| CN-118006168-A | High-shear UV flame-retardant ink for insulating and protecting battery cells and preparation method thereof | 东莞市联灏新材料技术开发有限公司 | 2024-05-10 | — | — | CN | claimed |
| CN-113867101-B | White photosensitive cover film composition for LED, cover film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2023-10-24 | — | — | CN | claimed |
| CN-113388075-B | Composition for 3D printing, 3D printing method and device | 珠海赛纳三维科技有限公司 | 2023-03-24 | — | — | CN | claimed |
| WO-2022258030-A1 | COMPOSITION FOR 3D PRINTING, AND 3D PRINTING METHOD AND DEVICE | 珠海赛纳三维科技有限公司 | 2022-12-15 | — | — | WO | claimed |
| CN-109884859-B | High-flexibility and high-resolution photosensitive epoxy acrylic resin composition | 杭州福斯特电子材料有限公司 | 2022-06-10 | — | — | CN | claimed |
| CN-120152853-A | Ink jet recording apparatus and ink jet recording method | 富士胶片株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120005376-A | Resin composition and product thereof | 台光电子材料(昆山)股份有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-120005377-A | Polymer, resin composition containing the same, product and preparation method thereof | 台光电子材料(昆山)股份有限公司 | 2025-05-16 | — | — | CN | disclosed |
| US-20250154353-A1 | RESIN COMPOSITION AND ARTICLE MADE THEREFROM | ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD. (CN) | 2025-05-15 | — | — | US | disclosed |
| US-20250154313-A1 | POLYMER, RESIN COMPOSITION, ARTICLE COMPRISING THE SAME, AND PREPARATION METHOD THEREOF | ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD. (CN) | 2025-05-15 | — | — | US | disclosed |
| WO-2022258030-A1 | COMPOSITION FOR 3D PRINTING, AND 3D PRINTING METHOD AND DEVICE | 珠海赛纳三维科技有限公司 | 2022-12-15 | — | — | WO | disclosed |
| CN-112534005-B | Production of decorated leather | 爱克发有限公司 | 2022-11-11 | — | — | CN | disclosed |
| CN-112334551-B | Acylphosphine oxide initiators | 爱克发有限公司 | 2022-11-08 | — | — | CN | disclosed |
| CN-114839838-A | Photosensitive resin composition | 味之素株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-109884859-B | High-flexibility and high-resolution photosensitive epoxy acrylic resin composition | 杭州福斯特电子材料有限公司 | 2022-06-10 | — | — | CN | disclosed |