SCHEMBL296999

SCHEMBL296999

CCC(C)[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18233518 1.00
Isobutane SCHEMBL27347530 0.95
Propane SCHEMBL27511654 0.95
Propane SCHEMBL4016686 0.74 TSHR (0.36)
SCHEMBL28211025 0.74
SCHEMBL15122183 0.74
SCHEMBL15915764 0.70
SCHEMBL3967924 0.70 TSHR (0.35)
SCHEMBL2518541 0.70
SCHEMBL28659923 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 690 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114507303-A External electron donor for olefin polymerization, catalyst system and olefin polymerization method 中国石油化工股份有限公司 2022-05-17 CN claimed
CN-109545424-A A kind of conductive silver paste and its preparation method and application 苏州晶银新材料股份有限公司 2019-03-29 CN claimed
US-20170178899-A1 DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES LAM RESEARCH CORPORATION 2017-06-22 US claimed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN claimed
CN-104284997-B The method preparing silicon-containing film on film transistor device 气体产品与化学公司 2016-08-17 CN claimed
US-8993460-B2 Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants NOVELLUS SYSTEMS, INC. (US) 2015-03-31 US claimed
CN-104284997-A Methods for making silicon containing films on thin film transistor devices AIR PROD & CHEM 2015-01-14 CN claimed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US claimed
US-20140193983-A1 APPARATUSES AND METHODS FOR DEPOSITING SiC/SiCN FILMS VIA CROSS-METATHESIS REACTIONS WITH ORGANOMETALLIC CO-REACTANTS NOVELLUS SYSTEMS, INC. 2014-07-10 US claimed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN claimed
EP-2287231-B1 Ulltraviolet transmissive polyhedral silsesquioxane polymers PANASONIC CORP (JP) 2012-06-06 EP claimed
US-20110251357-A1 ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS PANASONIC ELECTRIC WORKS CO., LTD. 2011-10-13 US claimed
EP-2287231-A2 Ulltraviolet transmissive polyhedral silesquioxane polymers Panasonic Electric Works Co., Ltd. (JP) 2011-02-23 EP claimed
US-20060122351-A1 Ultraviolet transmissive polyhedral silsesquioxane polymers PANASONIC ELECTRIC WORKS CO., LTD. (JP) 2006-06-08 US claimed
US-5696546-A Ink supply cartridge with ink jet printhead having improved fluid seal therebetween XEROX CORPORATION (US) 1997-12-09 US claimed
WO-1991000284-A1 SILYL DERIVATIVES OF 2,6-DIMETHYL-4-ALLYL PHENOL ARISTECH CHEMICAL CORPORATION (US) 1991-01-10 WO claimed
US-12642026-B2 Nitrogen-containing aromatic or ring structure molecules for plasma etch and deposition AMERICAN AIR LIQUIDE, INC. (US) 2026-05-26 US disclosed
US-20260090294-A1 DOPED SILICON OR BORON LAYER FORMATION LAM RES CORP (US) 2026-03-26 US disclosed
US-4585849-A MOISTURE-CURABLE BAYER AKTIENGESELLSCHAFT (DE) 1986-04-29 US disclosed
EP-0138103-A2 RTV silicone pastes BAYER AG (DE) 1985-04-24 EP disclosed