SCHEMBL29737745

SCHEMBL29737745

C=CC(=O)OCCCCCCCCCC[Si](C)(OCC)OCC

nearest known ligand 0.59

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.59
ALDH1A1 P00352 4/20 0.59
CYP3A4 P08684 2/20 0.59
HPGD P15428 1/20 0.54
TP53 P04637 3/20 0.42
HIF1A Q16665 3/20 0.42
HSD17B10 Q99714 1/20 0.42
THRB P10828 2/20 0.40
HCAR2 Q8TDS4 3/20 0.38
ATM Q13315 1/20 0.37
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ACHE P22303 4/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29737735 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL16286756 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL29737740 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL29737744 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL16537213 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL21402795 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL29737746 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL29737752 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL29737748 1.00 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL8154703 0.98 TSHR (0.56) TSHRALDH1A1CYP3A4HPGDTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4563609-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, AND COATED ARTICLE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-06-04 EP disclosed
CN-119585328-A Photocurable composition, cured product thereof, and coated article 信越化学工业株式会社 2025-03-07 CN disclosed
WO-2024024370-A1 PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, AND COATED ARTICLE 信越化学工業株式会社 2024-02-01 WO disclosed
US-11883790-B2 Hollow particles, method for producing same, and usage of same SEKISUI KASEI CO., LTD. (JP) 2024-01-30 US disclosed
CN-117015435-A Hollow particles and uses thereof 积水化成品工业株式会社 2023-11-07 CN disclosed
CN-111902206-B Hollow particles, method for producing same, and use thereof 积水化成品工业株式会社 2023-03-24 CN disclosed
EP-3514192-B1 HOLLOW PARTICLES AND USE THEREOF SEKISUI PLASTICS (JP) 2022-11-16 EP disclosed
WO-2022202784-A1 HOLLOW PARTICLES AND USE THEREOF 積水化成品工業株式会社 2022-09-29 WO disclosed
US-20220288550-A1 HOLLOW PARTICLES AND USE THEREOF SEKISUI PLASTICS CO., LTD. (JP) 2022-09-15 US disclosed
US-11369935-B2 Hollow particles and use thereof SEKISUI PLASTICS CO., LTD. (JP) 2022-06-28 US disclosed