⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10707706 | 0.85 | APEX1 (0.32) | — | |
| SCHEMBL10707709 | 0.85 | APEX1 (0.32) | — | |
| SCHEMBL1482323 | 0.82 | PTGS1 (0.32) | — | |
| SCHEMBL2968133 | 0.81 | GRIK1 (0.31) | — | |
| SCHEMBL4271614 | 0.78 | — | — | |
| SCHEMBL2399281 | 0.74 | THRB (0.30) | — | |
| SCHEMBL3623158 | 0.74 | TUBB1 (0.32) | — | |
| SCHEMBL3859913 | 0.73 | — | — | |
| SCHEMBL28894290 | 0.73 | THRB (0.33) | — | |
| SCHEMBL6573659 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |