SCHEMBL2979332

SCHEMBL2979332

C=C(CCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.38
THRB P10828 1/20 0.36
TBXAS1 P24557 1/20 0.30
GBA1 P04062 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6017090 1.00 TET2 (0.38) TET2THRBTBXAS1GBA1
SCHEMBL1006535 1.00 TET2 (0.38) TET2THRBTBXAS1GBA1
SCHEMBL346143 1.00 TET2 (0.38) TET2THRBTBXAS1GBA1
SCHEMBL1490384 1.00 TET2 (0.38) TET2THRBTBXAS1GBA1
SCHEMBL968005 1.00 TET2 (0.38) TET2THRBTBXAS1GBA1
SCHEMBL347320 0.98 TET2 (0.39) TET2THRBTBXAS1
SCHEMBL9063878 0.93 TET2 (0.36) TET2THRBTBXAS1GBA1
SCHEMBL5525486 0.93 TET2 (0.40) TET2THRBTBXAS1
SCHEMBL3316604 0.90 TET2 (0.38) TET2THRB
SCHEMBL347265 0.90 TET2 (0.40) TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024009895-A1 COMPOSITION CONTAINING (METH)ACRYLIC POLYMER AND METAL PARTICLES 株式会社レゾナック 2024-01-11 WO disclosed
WO-2023223979-A1 COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ACRYLIC COPOLYMER 株式会社レゾナック 2023-11-23 WO disclosed
WO-2023223978-A1 COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ESTER-BASED THIXOTROPY-IMPARTING AGENT 株式会社レゾナック 2023-11-23 WO disclosed
US-8247165-B2 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern JSR CORPORATION (JP) 2012-08-21 US disclosed
US-7781142-B2 Copolymer and top coating composition JSR CORPORATION (JP) 2010-08-24 US disclosed
US-20080038661-A1 Copolymer and Top Coating Composition JSR CORPORATION (JP) 2008-02-14 US disclosed
US-20070269734-A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern JSR CORPORATION (JP) 2007-11-22 US disclosed
EP-0537578-B1 Blocked polyisocyanate dispersable in water, process for its preparation and its use BAYER AG (DE) 1996-07-31 EP disclosed
EP-0490150-B1 Water-dispersible polyetherester-modified polyurethane ionomers having stability against electrolytes BAYER AG (DE) 1995-07-26 EP disclosed
EP-0429983-B1 Water and oil repellant composition BAYER AG (DE) 1994-05-04 EP disclosed
EP-0537578-A2 Blocked polyisocyanate dispersable in water, process for its preparation and its use BAYER AG (DE) 1993-04-21 EP disclosed
EP-0490150-A2 Water-dispersible polyetherester-modified polyurethane ionomers having stability against electrolytes BAYER AG (DE) 1992-06-17 EP disclosed
EP-0429983-A2 Water and oil repellant composition BAYER AG (DE) 1991-06-05 EP disclosed