SCHEMBL2980083

SCHEMBL2980083

CC(C)Cc1cccc([Al])c1CC(C)C

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.52
GABRB2 P47870 2/20 0.52
ELANE P08246 1/20 0.31
CTSG P08311 1/20 0.31
SLC6A2 P23975 2/20 0.30
TAAR1 Q96RJ0 2/20 0.30
MAOA P21397 1/20 0.30
SLC6A4 P31645 1/20 0.30
SLC6A3 Q01959 1/20 0.30
SIGMAR1 Q99720 1/20 0.30
CYP2A6 P11509 1/20 0.30
ADORA2A P29274 1/20 0.30
ADORA1 P30542 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2743774 0.84 GABRA1 (0.62) GABRA1GABRB2ELANECTSGSLC6A2
Carbimide SCHEMBL28662233 0.77 GABRA1 (0.54) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL301137 0.75 GABRA1 (0.52) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL9340072 0.75 GABRA1 (0.52) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL9182508 0.75 GABRA1 (0.52) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL2399172 0.75 GABRA1 (0.52) GABRA1GABRB2SLC6A2TAAR1MAOA
SCHEMBL2042941 0.75 GABRA1 (0.52) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL677035 0.75 GABRA1 (0.52) GABRA1GABRB2ELANECTSGSLC6A2
SCHEMBL258656 0.75 GABRA1 (0.63) GABRA1GABRB2ELANECTSG
SCHEMBL248342 0.74 GABRA1 (0.48) GABRA1GABRB2ELANECTSG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9150962-B2 Method for producing substrate with metal body JSR CORPORATION (JP) 2015-10-06 US disclosed
US-20140134331-A1 METHOD FOR PRODUCING SUBSTRATE WITH METAL BODY JSR CORPORATION (JP) 2014-05-15 US disclosed
US-7776766-B2 Trench filling method JSR CORPORATION (JP) 2010-08-17 US disclosed
EP-2204472-A2 Methods for forming wiring and electrode JSR Corporation (JP) 2010-07-07 EP disclosed
EP-1462544-B1 Methods for forming wiring and electrode JSR CORP (JP) 2010-05-19 EP disclosed
US-7429778-B2 Methods for forming wiring and electrode JSR CORPORATION (JP) 2008-09-30 US disclosed
US-20080194118-A1 Trench Filling Method JSR CORPORATION (JP) 2008-08-14 US disclosed
US-7071084-B2 Methods for forming wiring and electrode JSR CORPORATION (JP) 2006-07-04 US disclosed
US-20060024937-A1 Methods for forming wiring and electrode JSR CORPORATION (JP) 2006-02-02 US disclosed
US-6953600-B2 Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices JSR CORPORATION (JP) 2005-10-11 US disclosed
US-20040192038-A1 Methods for forming wiring and electrode JSR CORPORATION (JP) 2004-09-30 US disclosed
EP-1462544-A2 Methods for forming wiring and electrode JSR Corporation (JP) 2004-09-29 EP disclosed
US-20030224152-A1 Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices JSR CORPORATION (JP) 2003-12-04 US disclosed