Nitrogen

Nitrogen

SCHEMBL2980327

COc1cccc(Nc2ccccc2)c1.N#N

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1B P49286 6/20 0.61
MTNR1A P48039 4/20 0.61
MEN1 O00255 5/20 0.61
KMT2A Q03164 5/20 0.61
MAPT P10636 2/20 0.61
POLB P06746 2/20 0.61
MAPK1 P28482 1/20 0.61
RAPGEF4 Q8WZA2 1/20 0.57
ALDH1A1 P00352 1/20 0.56
AR P10275 1/20 0.56
NPC1 O15118 4/20 0.55
RAB9A P51151 3/20 0.55
GAA P10253 2/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
NLRP3 Q96P20 1/20 0.54
LMNA P02545 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
AKR1C3 P42330 1/20 0.54
AKR1C2 P52895 1/20 0.54
TSHR P16473 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL917608 0.96 MTNR1B (0.65) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL30080139 0.96 MTNR1B (0.65) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL9479608 0.94 MTNR1B (0.68) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL9479511 0.94 MTNR1B (0.68) MTNR1BMTNR1AMEN1KMT2AMAPT
Sulfuric Acid SCHEMBL11063970 0.90 MTNR1B (0.60) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL1921496 0.90 MTNR1B (0.72) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL1085867 0.90 MEN1 (0.71) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL13302353 0.88 MEN1 (0.69) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL7559758 0.87 MTNR1B (0.60) MTNR1BMTNR1AMEN1KMT2AMAPT
SCHEMBL30741237 0.86 KMT2A (0.71) MTNR1BMTNR1AMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107209459-B Photosensitive resin composition, lithographic printing plate precursor, and polymer compound 富士胶片株式会社 2021-03-09 CN disclosed
CN-107077069-B Photosensitive resin composition, lithographic printing plate precursor, method for producing lithographic printing plate, and polymer compound 富士胶片株式会社 2020-08-14 CN disclosed
US-8771920-B2 Lithographic printing plate precursor and method of preparing the same FUJIFILM CORPORATION (JP) 2014-07-08 US disclosed
US-20120251954-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING THE SAME FUJIFILM CORPORATION (JP) 2012-10-04 US disclosed
US-20100173248-A1 PLATE SURFACE TREATMENT AGENT FOR LITHOGRAPHIC PRINTING PLATE AND METHOD FOR TREATING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-07-08 US disclosed
EP-2204698-A1 Plate surface treatment agent for lithographic princting plate and method for treating lithographic printing plate FUJIFILM Corporation (JP) 2010-07-07 EP disclosed
EP-2036721-A1 Planographic printing plate precursor FUJIFILM Corporation (JP) 2009-03-18 EP disclosed
US-20070207412-A1 Method of producing planographic printing plate, and planographic printing plate FUJIFILM CORPORATION (JP) 2007-09-06 US disclosed
US-6977131-B2 Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2005-12-20 US disclosed
US-20050069809-A1 Process for the prevention of coating defects KODAK POLYCHROME GRAPHICS GMBH 2005-03-31 US disclosed
EP-1519229-A2 Process for the prevention of coating defects Kodak Polychrome Graphics GmbH (DE) 2005-03-30 EP disclosed
EP-1508071-A1 RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING Kodak Polychrome Graphics LLC (US) 2005-02-23 EP disclosed
US-6841330-B2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2005-01-11 US disclosed
WO-2003102692-A1 RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING KODAK POLYCHROME GRAPHICS LLC (US) 2003-12-11 WO disclosed
US-20030224284-A1 Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements CITICORP NORTH AMERICA, INC., AS AGENT 2003-12-04 US disclosed
US-4486529-A WAVELENGTH GREATER THAN 450 NANOMETERS AMERICAN HOECHST CORPORATION (US) 1984-12-04 US disclosed
US-4248959-A Preparation of diazo printing plates using laser exposure AMERICAN HOECHST CORPORATION (US) 1981-02-03 US disclosed